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전자빔 조사에 따른 GZO/TiO 2 박막의 특성 변화
김승홍 ( Seung Hong Kim ),김선경 ( Sun Kyung Kim ),김소영 ( So Young Kim ),허성보 ( Sung Bo Heo ),최동혁 ( Dong Hyu Choi ),손동일 ( Dong Il Son ),김대일 ( Dae Ll Kim ) 한국열처리공학회 2013 熱處理工學會誌 Vol.26 No.6
We have considered the influence of electron irradiation energy of 300, 600 and 900 eV on the stuctural,electrical and optical properties of GZO/TiO2 thin films prepared with RF magentron sputtering. The optical transmittance and electrical resistivity of the films were dependent on the electron`s irradiation energy. The electron irradiated GZO/TiO2 films at 900 eV are grown as a hexagonal wurtzite phase and the resistivity is decreased with electron irradiation energy. The GZO/TiO2 films irradiated at 900 eV shows the lowest resistivity of 4.3 × 10-3Ωcm. The optical transmittance in a visible wave length region also increased with the electron irradiation energy. The film that electron irradiated at 900 eV shows 82% of optical transmittance and higher work function of 5.18eV in this study.