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이재종,최기봉,김기홍,임형준,Lee, JaeJong,Choi, KeeBong,Kim, GeeHong,Lim, HyungJun 한국진공학회 2015 진공 이야기 Vol.2 No.1
With the recognition of nanotechnology as one of the future strategic technologies, the R&D efforts have been performed under exclusive supports of governments and private sectors. At present, nanotechnology is at the focus of research and public attention in almost every advanced country including USA, Japan, and many others in EU. Keeping tracks of such technical trends, center for nanoscale mechatronics and manufacturing (CNMM) was established in 2002 as a part of national nanotechnology promotion policy led by ministry of science and technology (MOST) in Korea. It will hold widespread potential applications in electronics, optical electronics, biotechnology, micro systems, etc, with the promises of commercial visibility and competitiveness. In this paper, wafer scale multilayer nanoimprint lithography technology which is well-known the next generation lithography, roll-typed nanoimprint lithography (R-NIL), roll-typed liquid transfer imprint lithography (R-LTIL), the key technology for nanomanufacturing and nanoscale measurement technology will be introduced. Additionally, its applications and some achievements such as solar cell, biosensor, hard disk drive, and MOSFET, etc by means of the developed multilayer nanoimprint lithography system are introduced.
이재종(JaeJong Lee),최기봉(KeeBong Choi),김기홍(GeeHong Kim),이승우(SeungWoo Lee),조현택(HyunTaek Cho) 한국생산제조학회 2006 한국공작기계학회 춘계학술대회논문집 Vol.2006 No.-
Nanoimprint lithography is a promising technology to produce sub-50㎚ half-pitch features on silicon chips. The contact-based nano lithography, such as thermal and/or UV nano-imprint, is well-known as the next generation lithography. Especially, the UV nano-imprint lithography technology has advantages of the simple process, low cost, high replication fidelity, and relatively high throughput(1). To achieve nano-imprinting process, nano-imprinting lithography equipment must have required some multi-functional units which are imprinting head, self-alignment wafer stage, overlay and alignment system for multi-layer process, master with sub-50㎚ half-pitch patterns, and anti-vibration unit, etc.
이재종(JaeJong Lee),박수연(SooYeon Park),김신호(ShinHo Kim) 한국생산제조학회 2007 한국공작기계학회 춘계학술대회논문집 Vol.2007 No.-
The contact-based nanoimprinting lithography (NIL), such as thermal and/or UV nano-imprint, has been well known as one of the next generation lithography alternatives. Especially, the thermal nano-imprinting lithography technology has the advantages in terms of process simplicity, low cost, high replication fidelity, and relatively high throughput. In case of nanoimprinting process, a master stamp fabrication and its lifetime are key issues in order to fabricate nanoscale patterns on the Si and quartz substrate. The lifetime of the master stamp is caused by using various materials and imprinting pressure to make replica with nanoscale patterns. Generally, the master stamp fabrication cost is proportional increased to fabrication frequency of the nano-patterned master stamp. In this paper, the replication process for the replicas which has the high fidelity and high quality are proposed to get over the short lifetime and high cost problems to fabricate nanoscale stamp. In order to do, thermal imprinting lithography tool which is developed by KIMM was used to do 4inch Si and quartz stamp replication.
이재종(JaeJong Lee),최기봉(KeeBong Choi),김기홍(GeeHong Kim),이승우(SeungWoo Lee),박수연(SooYeon Park) 대한기계학회 2006 대한기계학회 춘추학술대회 Vol.2006 No.6
The contact-based nanoimprinting lithography (NIL), such as thermal and/or UV nano-imprint, has been well known as one of the next generation lithography alternatives. Especially, the UV nano-imprinting lithography technology has the advantages in terms of process simplicity, low cost, high replication fidelity, and relatively high throughput. The UV nanoimprinting lithography tool is built with the characteristic functions like a self-alignment wafer stage, a nanoimprinting head unit, an alignment system for multi-layer process, master/wafer chucking units, releasing unit, and anti-vibration unit, etc. This UV-NIL tool is comprised of UV light source using mercury lamp, ultra-fine XY stage with nano-level positioning accuracy, and self-adjusting flexure stage. The self-adjusting stage has the capability to control 6-axes positions of wafer-holder.
이재종(Jaejong Lee),김영웅(Youngung Kim),정인환(Inhwan Jung) 한국정보과학회 2003 한국정보과학회 학술발표논문집 Vol.30 No.2Ⅲ
프로토콜 분석이란 이더넷(Ethernet)의 특성인 동보 기능(broadcasting)을 이용하여 LAN에 흘러 다니는 모든 패킷들을 실시간으로 수집하여 OSI 7 Layer별로 분석하는 것을 의미한다. 아직까지는 프로토콜 분석기가 일반 PC에서 사용이 가능한 형태로 개발되어 있는 실정이며 무선 LAN을 대상으로, 특히 PDA 상에서 사용 가능한 프로토콜 분석기는 찾아보기 어렵다. 무선 LAN은 중계기 역할을 하는 Access Point가 곳곳에 지역적으로 분산되어 설치되어야 한다. 본 논문에서는 이러한 무선 LAN 특성상 이동이 용이한 PDA 상에서 무선망의 운영 상태를 파악하고 검사할 수 있는 프로토콜 분석기를 설계하고 구현한다.