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D. M. Han,J. H. Lee,K. H. Jeong,이재갑 대한금속·재료학회 2010 METALS AND MATERIALS International Vol.16 No.4
During surface treatment using O2/CF4 plasma chemistry, the bias power applied to the indium-tin-oxide(ITO)substrate significantly degrades the electrical and optical performance of the organic light emitting diode (OLED) formed on the ITO electrode as a result of the formation of CFx polymer, In-Sn-F compounds,and structural defects. Application of bias power to the substrate effectively increases the sheath potential over the substrate and thus the flux of CFx + ion created in the O2/CF4 plasma, which leads to the production of CFx polymers as well as structural defects.