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- 저자 : 이석주(Seuk Joo Rhee) (검색결과 7 건)
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수소 플라즈마 처리를 거친 ZnO 박막에 대한 PL 연구
조재원,이석주,Cho, Jaewon,Rhee, Seuk Joo 한국전기전자재료학회 2015 전기전자재료학회논문지 Vol.28 No.1
The physical effects of H-plasma treatment on ZnO thin film have been studied using photoluminescence(PL) spectroscopy. Four characteristic peaks have been identified: (i) $D^0X$ peak (neutral donor-bound exciton), showing relatively small integrated intensity after H-plasma treatment, indicates that H-plasma passivates the neutral donors in ZnO at low temperatures. The rapid decrease in the integrated intensity of the peak as the temperature goes up is considered to be due to the ionization of neutral donors. (ii) H-related complex-bound exciton peak appears at the low temperatures (10 K~80 K) after H-plasma treatment, showing the same thermal evolution as $D^0X$ peak. (iii) FX (free exciton) peak starts to show up at 60 K and grows more and more as the temperature goes up, which is considered to be related to the increase in free electron concentration in the film. (iv) violet band is intensified after H-plasma, which means more defects and impurities are generated by H-plasma process.
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조현민,이석주,조재원,Cho, Hyun-Min,Rhee, Seuk-Joo,Cho, Jae-Won 한국전기전자재료학회 2010 전기전자재료학회논문지 Vol.23 No.2
We have studied the effect of the chemical composition of the ZnO nanorod surface on the optical characteristics. The surface was treated with H- and O-plasma at different surface temperatures. The chemical composition of the surface of the ZnO nanorod, being investigated by Auger Electron Spectroscopy(AES), was related to the Photoluminescence(PL) data reported in our previous results. The AES showed the opposite results for the $H_2$ and $O_2$ plasma treatments. The ratio of Zn to O on the surface of the ZnO nanorod increased in the case of $H_2$ plasma, while the composition rate of O increased after $O_2$ plasma treatment. The AES results seems to be correlated to the shift in PL peaks. The increase in the composition rate of Zn on the surface of ZnO nanorod is considered to cause the blue shift of the UV peak. On the contrary, the relative increase of O is considered to cause the red shift in PL peaks.
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수소 Plasma 처리 후의 MgO 보호막에 대한 일함수 변화 측정
정재천,이석주,조재원,Jeong, Jae-Cheon,Rhee, Seuk-Joo,Cho, Jae-Won 한국전기전자재료학회 2007 전기전자재료학회논문지 Vol.20 No.7
The changes in the work $function({\Phi}_w)$ in the MgO protective layers after $plasma(Ar,\;H_2)$ treatment have been studied using ${\Upsilon}-focused$ ion beam $({\Upsilon}-FIB)$ system. The ${\Phi}_w$ was determined as follows: Ar-plasma $treatment({\Phi}_w=4.52eV)$, $H_2-plasma$ $treatment({\Phi}_w=5.65eV)$, and non-plasma $treatment({\Phi}_w=4.64eV)$. The results indicated that the H-plasma could not make any effective physical etching due to the small masses of hydrogen atoms and molecules while the hydration of H-plasma could grow some contaminating materials on the surface of MgO.
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조재원,이석주,Cho, Jae-Won,Rhee, Seuk-Joo 한국전기전자재료학회 2011 전기전자재료학회논문지 Vol.24 No.12
The optical properties of ZnO thin film, being treated by O-plasma, have been studied using Photoluminescence(PL) spectroscopy with the change of temperature from 10 K to 290 K. Two characteristic peaks were identified at 10 K : 3.357 eV($D^{\circ}X$) and 3.324 eV(TES). The peak of $D^{\circ}X$ is believed to be due to neutral donor bound excitons where the donor is in the ground state. However, the TES(Two Electron Satellite) peak indicates the excited state of the donor(excitation energy was ~30 meV). The donor binding energy was estimated to be 44 meV, which indicates the possible presence of the neutral donor bound excitons at RT. The thermal effect including thermal broadening was identified from temperature evolution of the spectrum. Both the peak intensity and the peak energy have decreased as the temperature increases. As the temperature approaches to RT, the two peak merges into one broad peak, which is considered a combination of multiple peaks having different physical origins.
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Eu이 이온주입된 undoped와 Mg-doped GaN의 분광 특성 연구
이소원,문주영,이석주,Lee, So-Won,Moon, Joo-Young,Rhee, Seuk-Joo 한국진공학회 2008 Applied Science and Convergence Technology Vol.17 No.4
Eu sites and the effect of Mg codoping were investigated in Eu-implanted GaN films. Photoluminescence (PL) and PL excitation spectroscopies were performed on 620nm $^5D_0\;{\rightarrow}\;^7F_2$ Eu ionic level transition and revealed the existence of 4 different Eu sites including the known 2 sites. PL intensity from one of the sites increased by a factor of 1.6 by the Mg-codoping. The enhancement of PL by Mg-codoping was less pronounced than Er- and Nd-implanted GaN, in which the trap-mediated energy transfer dominates. In GaN:Eu the above-gap excitation transfers the energy directly to the Mg related Eu site. Eu을 이온주입한 GaN 시료에 대하여 Eu의 site들에 대한 연구와 Mg을 같이 도핑하였을 때의 효과를 분석하였다. 빨간색 광원으로 주목받는 620nm 근처의 Eu의 $^5D_0\;{\rightarrow}\;^7F_2$ 전이에 대하여 photoluminescence (PL) 와 PL 여기 분광법을 이용하여 GaN 내에서 Eu 이온이 자리하는 이미 알려진 2 개의 site 이외에도 2 종류의 site들이 있음을 확인하였다. 이들 중 한 site는 Mg의 codoping에 의하여 PL 크기가 약 1.6배 증가하였다. 이는 GaN의 밴드갭보다 작은 trap에 의해 에너지를 전달받는 Er이나 Nd보다 Mg의 도핑에 의한 효과가 매우 작은 것이다. GaN:Eu에서는 Mg과 관련된 trap을 통하지 않고 GaN에서 직접 Eu으로 에너지를 전달하기 때문으로 생각된다.
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플라즈마 처리가 ZnO 박막의 물리적 특성에 미치는 영향
조재원,정태영,이석주,Cho, Jae-Won,Joung, Tae-Young,Rhee, Seuk-Joo 한국전기전자재료학회 2011 전기전자재료학회논문지 Vol.24 No.3
The characteristic changes in ZnO thin film according to H- and O- plasma treatments have been studied by Photoluminescence (PL) spectroscopy at room temperature. The red shift of UV peak by 20-30 meV in PL spectra after plasma treatments is identified, which indicates that there are changes in the binding energy of bound exciton and/or the movement of energy levels of lattice defects and impurities. The width of UV peak is decreased after plasma treatments, which is believed to be closely related to the crystal quality of ZnO film. The increase of UV peak intensity after H-plasma treatment is also observed, and this could mean that the radiative recombination is strengthened because the hydrogen atoms in the plasma diffuse into the film where they passivate and neutralize the defects and the impurities.
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초격자 Buffer를 사용한 InGaN/GaN 양자우물에서 Piezoelectric 효과의 측정과 Strain 감소에 대한 연구
공경식,안주인,이석주,Kong, Kyoung-Shick,An, Joo-In,Rhee, Seuk-Joo 한국전기전자재료학회 2008 전기전자재료학회논문지 Vol.21 No.6
In order to reduce the piezoelectric field originated from the well layer which resides in InGaN/GaN light emitting diode, InGaN/GaN superlattice buffer layers were grown at the bottom and the top of the active layer. Measuring the photoluminescence spectra with different reverse bias voltages clearly revealed the condition of the flat band under which the transition energy is maximized and the linewidth is minimized. Accordingly, the piezoelectric field of $In_{0.15}Ga_{0.85}N$ in our sample was estimated as -1.08 MV/cm. It is less than half the value reported in the previous studies, and it is evidenced that the strain has reduced due to the superlattice buffer layers.
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