후면 위상 패턴을 이용한 투과율 조절 포토마스크

박종락,박진홍,Park, Jong-Rak,Park, Jin-Hong 한국광학회 2004 한국광학회지 Vol.15 No.1

후면의 석영면에 위상 패턴을 형성하여 투과율 조절을 구현한 포토마스크에 대해 보고한다. 위상 패턴의 크기와 패턴 조밀도에 따른 조명 동공의 형태 변화에 관한 이론적 결과와 투과율 조절 포토마스크를 사용한 웨이퍼 상 CD(critical dimension) 균일도 개선에 관한 실험적 결과에 대해 기술한다. 투과율 조절을 위한 위상 패턴은 패턴이 형성되지 않은 영역에 대해 180$^{\circ}$의 상대적 위상을 갖도록 석영면을 식각한 콘택홀 형태의 패턴을 사용하였다. 콘택홀 패턴의 크기가 작을수록 본래의 조명동공 형태를 유지하게 되며, 동일한 패턴 조밀도에서 더욱 큰 노광 광세기 저하가 일어남을 알 수 있었다. 패턴 조밀도를 위치별로 변화시켜 CD균일도 개선에 적합한 투과율 분포를 포토마스크 후면에 형성하였다. 투과율 조절 포토마스크를 140nm 디자인 롤을 갖고 있는 DRAM(Dynamic Random Access Memory)의 한 주요 레이어에 적용하여 CD 균일도를 3$\sigma$값으로 24.0nm에서 10.7nm 로 개선할 수 있었다. We report on a transmittance controlled photomask with phase patterns on the back quartz surface. Theoretical analysis for changes in illumination pupil shape with respect to the variation of size and density of backside phase patterns and experimental results for improvement of critical dimension uniformity on a wafer by using the transmittance controlled photomask are presented. As phase patterns for controlling transmittance of the photomask we used etched contact-hole type patterns with 180" rotative phase with respect to the unetched region. It is shown that pattern size on the backside of the photomask must be made as small as possible in order to keep the illumination pupil shape as close as possible to the original pupil shape and to achieve as large an illumination intensity drop as possible at a same pattern density. The distribution of illumination intensity drop suitable for correcting critical dimension error was realized by controlling pattern density of the contact-hole type phase patterns. We applied this transmittance controlled photomask to a critical layer of DRAM (Dynamic Random Access Memory) having a 140nm design rule and could achieve improvement of the critical dimension uniformity value from 24.0 nm to 10.7 nm in 3$\sigma$..

조선대학교 광기술 공학과의 광기술 연구 및 교육 현황

박종락,Park, Jong-Rak 한국광학회 2007 광학과 기술 Vol.11 No.3

컴퓨터지원에 의한 웹기반의 효과적인 자동협상 지원 시스템구현

박종락(Jong Rak Park),정원(Won Jung) 한국SCM학회 2003 한국SCM학회지 Vol.3 No.2

아규먼트의 가중치속성을 이용한 최적협상시스템에 관한 연구

박종락(Park, Jong Rak),박관희(Park Kwan Hee),정원(Jung, Won) 대한산업공학회 2003 대한산업공학회 춘계학술대회논문집 Vol.2003 No.5

HTTP를 이용한 XML-QL기반 데이터 접근에 관한 연구

박종락(Jong-Rak Park) 한국산업정보학회 2002 한국산업정보학회논문지 Vol.7 No.5

자동차 암레스트의 인몰드코팅에 관한 실험적 연구

박종락(Jong-Rak Park),이호상(Ho-Sang Lee) 대한기계학회 2014 대한기계학회 춘추학술대회 Vol.2014 No.11

Mold design for in-mold coating were carried out in order to achieve simultaneous coating and injection molding of an automotive armrest. The developed mold consists of two molds and one sliding plate. The first mold includes a movable mold piece and a first fixed mold piece for injection molding of a substrate. On the substrate surface near a parting line, sealing edges were considered for forming a seal projection. The second mold includes the movable mold piece and a second fixed mold piece for forming the coating. The mold enables coating on the substrate surface after injection molding. The materials used were PC/ABS for substrate and 2-component Polyurethane for coating. The experiments were conducted by changing the flow rate in order to investigate mixing characteristics. As the flow rate increased, the mixing was more improved. And the bubbles appeared over the substrate surface decreased with an increase of the weight of injected coating material.

자동차 암레스트의 인몰드코팅에 관한 실험적 연구

박종락(Jong Rak Park),이호상(Ho Sang Lee) 대한기계학회 2015 大韓機械學會論文集A Vol.39 No.7

자동차 암레스트의 사출성형과 코팅을 동시에 구현하기 위하여 인몰드 코팅 금형을 설계하였다. 개발된 금형은 하나의 코어와 두개의 캐비티를 포함하고 있으며, 캐비티는 기재 캐비티와 코팅 캐비티로 이루어진다. 코어는 가동측 형판에 부착되었으며, 두개의 캐비티는 고정측 형판에서 슬라이딩하는 평판위에 설치되었다. 2 단계 공정으로 이루어지며 가장 먼저 사출성형된 제품은 슬라이딩 평판에 의하여 2 번째 캐비티로 전달되었다. 기재에 적용된 소재는 PC/ABS 이며, 코팅제로는 2 액형 폴리우레탄이 사용되었다. 코팅제의 토출유량을 변경하면서 실험을 수행하였으며, 주제와 경화제의 믹싱특성을 고찰하였다. 토출유량이 증가함에 따라 믹싱이 더욱 향상되었으며, 주입된 코팅제의 중량이 증가할수록 기재 표면에 발생하는 기포가 감소하였다. A mold design for in-mold coating was developed to achieve simultaneous coating and injection molding of an automotive armrest. The developed mold includes one core and two cavities which are composed of a substrate cavity and a coating cavity. The core was attached to a movable plate and two cavities were mounted on a plate sliding in a stationary plate. In a two-step process, the part was first injection molded and subsequently, with the aid of a sliding table, was transferred to a second cavity. The materials used were PC/ABS for substrate and two-component polyurethane for coating. The experiments were conducted by changing the flow rate to investigate mixing characteristics. As the flow rate increased, the mixing improved. Additionally, the bubbles appeared over the substrate surface decreased with an increase of the weight of injected coating material.

비구면 광학계를 적용한 LED 조명의 광학성능 향상에 관한 연구(I)

이학석,박종락,김민재,김혜정,김정호,Lee, Hak-Suk,Park, Jong-Rak,Kim, Min-Jae,Kim, Hye-Jeong,Kim, Jeong-Ho 한국전기전자재료학회 2009 전기전자재료학회논문지 Vol.22 No.12

Recently, Light Emitting Diode (LED) has many advantages in comparison with conventional light sources; low power consumption, long lifetime, and less environmental pollution. Therefore, the use of LED is increasing rapidly. In general, however, spherical lens is used in LED-lighting which cause many problems induces by optical aberration of spherical lens; low illumination, yellow belt, unpleasant feeling in human eye. As a solution of these problem, aspherical lens can be employed. This study reported the improvement of LED-lighting performance by adopting aspherical lens. From the commercial program, $LightTools^{TM}$, the optical problem were ensured. And then, to improve these problem, optimum aspheric form was designed using Code $V^{TM}$.

투과율 조절 포토마스크 기술의 ArF 리소그래피 적용

이동근,박종락,Lee, Dong-Gun,Park, Jong-Rak 한국광학회 2007 한국광학회지 Vol.18 No.1

본 논문에서는 포토마스크 후면에 위상 패턴을 형성하여 웨이퍼 상 CD(critical dimension) 균일도를 개선할 수 있는 투과율 조절 포토마스크 기술을 ArF 리소그래피에 적용한 결과에 대하여 보고한다. 위상 패턴 조밀도에 따른 노광 광세기 변화 계산에 포토마스크 후면으로부터 포토마스크 전면까지의 광의 전파를 고려하여 ArF 파장에서의 위상 패턴 조밀도에 따른 노광 광세기 저하에 관한 실험결과를 이론적으로 재현할 수 있었다. 본 기술을 ArF 리소그래피에 적용하여 DRAM(Dynamic Random Access Memory)의 한 주요 레이어에 대해 필드 내 CD 균일도를 $3{\sigma}$ 값으로 13.8 nm에서 9.7 nm로 개선하였다. We report theoretical and experimental results for application of transmittance-controlled photomask technology to ArF lithography. The transmittance-controlled photomask technology is thought to be a promising technique fo critical dimension (CD) uniformity correction on a wafer by use of phase patterns on the backside of a photomask. We could theoretically reproduce experimental results for illumination intensity drop with respect to the variation of backside phase patterns by considering light propagation from the backside to the front side of a photomask at the ArF lithography wavelength. We applied the transmittance-controlled photomask technology to ArF lithography for a critical layer of DRAM (Dynamic Random Access Memory) having a 110-nm design rule and found that the in-field CD uniformity value was improved from 13.8 nm to 9.7 nm in $3{\sigma}$.

용탕단조한 Al-7%Si-0.3%Mg 합금 봉상시료의 편석거동

김기영,기석도,박종락 ( Ki Young Kim,Seok Do Ki,Jong Rak Park ) 한국주조공학회 1993 한국주조공학회지 Vol.13 No.1

N/A Squeeze casting has advantages to improve mechanical properties of nonferrous castings without losing high productivity. Sound pore free structure makes it possible to be subjected to heat treatment and welding. This process became popular to produce lighter automobile parts alternating cast iron parts. It has, however, two disadvantages of segregation and scattered structure due to the solidified layers in sleeve. In this study segregation behavior of squeeze cast Al-7%Si-0.3%Mg alloy bars was investigated using HVSC machine under various injection conditions. Degree of segregation decreased with injection pressure and effect of injection velocity on it was small. Segregation mode of solute was strongly governed by solidification mode and flow pattern.