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이불화제논 기상 식각에 의한 실리콘 기판의 표면 텍스쳐링 특성
김선훈(Seon Hoon Kim),기현철(Hyun Chul Ki),김두근(Doo Gun Kim),나용범(Yong Beom Na),김남호(Nam Ho Kim),김회종(Hwe Jong Kim) 대한전기학회 2010 전기학회논문지 Vol.59 No.4
We investigated the haze and the surface roughness of textured Si substrates etched by XeF₂ etching system with the etching parameters of XeF₂ pressure, etching time, and etching cycle, Here, the haze was obtained as a function of wavelength from the measured reflectance, The haze of textured Si substrates was strongly affected by the etching parameter of etching cycle. The surface coughness of textured Si substrates was calculated with the haze and the scalar scattering theory at the wavel ngth of BDD ㎚. Then, the surface coughness was compared with that measured by atomic force microscope, The surface coughness5 obtained by two methods was changed with the similar tendency in terms of XeF₂ etching conditions.