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KrF Pulsed Laser Ablation 법으로 제조한 NdxFe90.98-xB9.02 박막의 자기특성
김상원(S. W. Kim),양충진(C. J. Yang) 한국자기학회 1997 韓國磁氣學會誌 Vol.7 No.6
NdFeB films have been grown onto Si (100) substrate by a KrF pulsed laser ablation of the targets of Nd_xFe_(90.98-x)B_(9.02) (x = 17.51~27.51) at the substrate temperature of 620~700℃ and the laser beam energy density of 2.75~5.99 J/㎠. The films exhibit no preferred orientation, however, good hard magentic properties were produced from as -deposited condition: 4 πMs ~_ 7 kG, 4 πMr ~_ 4 kG, and Hc = 300~1000 Oe. The depositon rate was not greatly influenced by changing the substrate temperature, but it increases linearly by increasing the beam energy density. The beam energy density of 3 J/㎠ gave the optimal condition to have the highest 4 πMr and Hc as well. The higher content of Nd induces a higher coercivity and 4 πMr at the same time without prominent change in 4 πMs.