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홍성갑,정용태,천경호,백순영,Hong, Seong-Gap,Jeong, Yong-Tae,Cheon, Gyeong-Ho,Baek, Sun-Yeong 한국미생물학회 2003 미생물학회지 Vol.39 No.4
본 연구에서는 에어컨 내에서 서식하는 세균을 분리하여 동정하였고 이들 에어컨에 대한 위생 관리에 대하여 조사하였다. 20개의 에어컨 냉각기에서 8종의 세균이 분리, 동정되었는데 그것들은 가장 많이 분리 동정된 Pantoea sp.를 비롯하여 Bacillus circulans, Bacillus pumilus, Corynebacterium, Flavimonas oryzihabitans, Ochrobacterum anthropi, Micrococcus sp., non fermented bacilli (NFB)이었다. 한편 에어컨 사용자 1,322명을 대상으로 에어컨의 위생관리 상태에 대하여 조사하였는데 설문자의 1,138명(86%)이 에어컨 사용시 환기를 하는 것으로 나타났다. 에어컨 청소에 있어서 1,128명(85%)이 청소를 하는 것으로 나타났지만 에어컨의 오염원들이 되는 에어컨의 필터 청소는 864명(66%)이 하지 않는 것으로 나타났고 에어컨의 열교환기는 1089명(82%)이 하지 않는 것으로 나타났다. 이런 결과로 상기에서 언급된 세균들과 같은 에어컨 오염원이 증가하면 호흡기 질환과 같은 인간의 질병을 초래할 수 있다는 것을 알 수 있었고 따라서 에어컨 사용시 에어컨의 오염원제거와 위생관리는 에어컨내 세균으로부터 발생되는 인간의 질병을 예방할 수 있을 것이다. This study was performed to identify the microorganisms from air conditioners and to investigate hygiene management on air conditioners. Eight species of bacteria were isolated and identified from twenty samples of coolers in air conditioners; Pantoea sp., Bacillus circulans, Bacillus pumilus, Corynebacterium, Flavimonas oryzihabitans, Ochrobacterum anthropi, Micrococcus sp., and non fermented bacilli (NFB). One thousand and three hundreds twenty-two persons who used air conditioners in their houses were investigated about the state of hygiene management in their air conditioners. One thousand and one hundred thirty eight persons (86%) of the total investigated persons ventilated their air conditioners and 1,128 persons (85%) of them cleaned their air conditioners. However, 864 persons (66%) of them did not clean filters and 1,089 persons (82%) did not clean the heat exchangers, both of which air conditioners could be easily contaminated by microorganisms. From these results, we could conclude that the contaminants, bacteria as mentioned the above, in air conditioners could cause human disease such as respiratory infections if the number of bacteria increase in air conditioners. Thus, the removal of contaminants and the improved hygiene of the air conditioners can prevent human diseases caused by the released bacteria during the use of air conditioners.
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Aniline 을 분해하는 Flavimonas oryzihabitans 균주의 분리 , 동정 및 분해특성
홍성갑(Seong Karp Hong),박용근(Yong Keun Park),이영록(Yung Nok Lee) 한국환경생물학회 1998 환경생물 : 환경생물학회지 Vol.16 No.3
Novel strains degrading aniline were isolated from soils containing many herbicides in Kyonggi-Do, when aniline was provided as a sole carbon and nitrogen source. Among of them, three strains were identified as Flavimonas oryzihabitans KH1, KH2, and KH3. All of these three strains metabolized aniline through ortho-cleavage pathway. F. oryzihabitans KH1, KH2, and, KH3 strains showed narrow substrate-range in their ability on degrading various aromatic compounds containing aniline and catechol derivatives : they were not able to degrade chloroanilines and chlorocatechol , KH1 is superior to the other strains in view of catechol-1,2-dioxygenase activity of 0.42 unit/㎎ at 260 ㎚ absorbance and oxygen consumption of 300 nmol/min/㎎ in oxidizing aniline (2 mM) as a substrate. Complete degradation of aniline (2 mM) with KH1 was identified by GC-Mass analysis.
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홍성진,이재갑 국민대학교 생산기술연구소 2002 공학기술논문집 Vol.25 No.-
Ag-alloy films have been investigated as interconnect materials applicable to thin film transistor liquid crystal displays (TFT-LCDs). Pure silver films deposited on SiO₂ and glass by DC magnetron sputtering,showed severe hillock formation, hole growth, and agglomeration upon annealing in air. On the other hand, APC Ag films, alloyed with 0.9 at.% of Pd and 1.7 at.% of Cu and Ag(5 at.% Mg) alloy films, showed enhanced resistance to agglomeration.
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Cu/Ti/SiO<sub>2</sub>/Si 구조에서 Ti 층 두께가 Ti 반응에 미치는 효과
홍성진,이재갑,Hong, Sung-Jin,Lee, Jae-Gab 한국재료학회 2002 한국재료학회지 Vol.12 No.11
The reactions of $Cu/Ti/SiO_2$ structures at temperatures ranging from 200 to $700^{\circ}C$ have been studied for various Ti thicknesses. The reaction products initially formed, at around $300^{\circ}C$, were a series of Cu-Ti intermetallics ($Cu_3$Ti/CuTi) with the oxygen dissolved in the Ti moving from the compounds into the remaining unreacted Ti. At $500^{\circ}C$, the $Cu_3$Ti was converted into Cu-rich intermetallics, $Cu_4$Ti, which grew at the expense of the CuTi due to the increased oxygen content in the Ti. In addition, the outdiffusion of Ti, to the Cu surface, and the $Ti-SiO_2$ reactions, caused an abrupt increase in the oxygen content in the Ti layer, which placed thermodynamic restraints on further Ti reactions. Furthermore, thinner Ti layers showed a higher increasing rate of oxygen accumulation for the same consumption of Ti, which led to significantly reduced Ti consumption. The $SiO_2$ film under the Ti diffusion barrier was more easily destroyed with increasing Ti thickness.
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Efficacy of Gene Transfer and Expression of Novel Recombinant Baculovirus Vector
권태동,홍성갑,Kweon, Tae-Dong,Hong, Seong-Karp The Korea Institute of Information and Commucation 2014 한국정보통신학회논문지 Vol.18 No.8
폴리히드론 프로모터, 수포성구내염 바이러스G, 폴리A, 사이토메가바이러스 프로모터, 강화녹색형광단백질, 단백질전달부위 유전자 등을 포함한 새로운 베큘로바이러스 시스템이 제조되었다. 본 재조합벡터 시스템은 인간 섬유아세포에 적용하여 시험하였고 재조합된 유전자의 전달과 유전자 발현을 대조 벡터시스템과 비교하였다. 본 연구로부터 새롭게 제작된 본 베큘로바이러스 시스템이 유전자의 전이와 유전자 발현 면에서 대조 벡터시스템 보다 고효율을 나타내었다. Novel baculovirus vector systems recombined with coding genes of polyhedron promoter, vesicular stomatitis virus G (VSVG), polyA, cytomegalovirus (CMV) promoter, enhanced green fluorescent protein (EGFP), and protein transduction domain (PTD) were constructed. These recombinant baculovirus vector systems were applied into human foreskin fibroblast cells and compared the effects of gene transfer and gene expression of these recombinant baculovirus vector systems with control vector system. From this study, it showed that these novel recombinant baculovirus vector systems were superior efficacy to control vector system in view of gene transfer and gene expression.
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Cu oxide의 형성과 H(hfac) 반응을 이용한 Cu 박막의 건식식각
양희정,홍성진,조범석,이원희,이재갑,Yang, Hui-Jeong,Hong, Seong-Jin,Jo, Beom-Seok,Lee, Won-Hui,Lee, Jae-Gap 한국재료학회 2001 한국재료학회지 Vol.11 No.6
O$_2$plasma와 H(hfac)을 이용한 Cu 박막의 건식 식각을 조사하였다. 휘발성이 큰 Cu(hfac)$_2$와 $H_2O$를 탈착시키기 위하여 $O_2$ Plasma를 이용한 Cu 박막의 산화와 생성된 Cu 산화막을 H(hfac)과의 반응으로 제거하는 공정으로 식각을 수행하였다. Cu 박막의 식각율은 50-700 /min의 범위를 보였으며, 기판온도, H(hfac)/O$_2$ 유량비, plasma power에 따라 변하였다. Cu 박막의 식각율은 기판온도 215$^{\circ}C$보다 높은 온도구간에서 RF power가 증가함에 따라 증가하였고, 산화 공정과 H (hfac)과의 반응이 균형을 이루는 최적의 H (hfac)/O$_2$ 유량비는 1:1임을 확인하였다. Ti mask를 사용한 Cu Patterning은 유량비 1 : 1, 기판온도 25$0^{\circ}C$에서 실시하였고, 30$^{\circ}$외 taper slope를 갖는 등방성 etching profile을 얻을 수 있었다. Taper angle을 갖는 Cu 건식 patterning은 고해상도의 대면적 thin film transistor liquid-crystal(TFT-LCDs)를 위래 필요한 것으로써 기판온도, RF power, 유량비를 조절한 one-step 공정으로부터 성공적으로 얻을 수 있었다. Dry etching of copper film using $O_2$ plasma and H(hfac) has been investigated. A one-step process consisting of copper film oxidation with an $O_2$ plasma and the removal of surface copper oxide by the reaction with H(hfac) to form volatile Cu(hfac)$_2$ and $H_2O$ was carried but. The etching rate of Cu in the range from 50 to 700 /min was obtained depending on the substrate temperature, the H(hfac)/O$_2$ flow rate ratio, and the plasma power. The copper film etch rate increased with increasing RF power at the temperatures higher than 215$^{\circ}C$. The optimum H(hfac)/O$_2$ flow rate ratio was 1:1, suggesting that the oxidation process and the reaction with H(hfac) should be in balance. Cu patterning using a Ti mask was performed at a flow rate ratio of 1:1 on 25$0^{\circ}C$\ulcorner and an isotropic etching profile with a taper slope of 30$^{\circ}$was obtained. Cu dry patterning with a tapered angle which is necessary for the advanced high resolution large area thin film transistor liquid-crystal displays was thus successfully obtained from one step process by manipulating the substrate temperature, RF power, and flow rate ratio.
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