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      • KCI등재후보

        한국 중부 지역의 태양광 모듈 타입에 따른 발전량 특성

        장효식(Chang Hyo Sik) 한국태양에너지학회 2018 한국태양에너지학회 논문집 Vol.38 No.1

        Solar panels are modules made up of many cells, like the N-type monosilicon, P-type monosilicon, P-type multisilicon, amorphous thin-film silicon, and CIGS solar cells. An efficient photovoltaic (PV) power is important to use to determine what kind of cell types are used because residential solar systems receive attention. In this study, we used 3-type solar panels - such as N-type monosilicon, P-type monosilicon, and CIGS solar cells - to investigate what kind of solar panel on a house or building performs the best. PV systems were composed of 3-type solar panels on the roof with each ~1.8 kW nominal power. N-type monosilicon solar panel resulted in the best power generation when monitored. Capacity Utilization Factor (CUF) and Performance Ratio (PR) of the N-type Si solar panel were 14.6% and 75% respectively. In comparison, N-type monosilicon and CIGS solar panels showed higher performance in power generation than P-type monosilicon solar power with increasing solar irradiance.

      • SCOPUSKCI등재

        결정질 실리콘 태양전지의 패시베이션 적용을 위한 Al<sub>2</sub>O<sub>3</sub>/SiON 적층구조의 열적 안정성에 대한 연구

        조국현,장효식,Cho, Kuk-Hyun,Chang, Hyo Sik 한국세라믹학회 2014 한국세라믹학회지 Vol.51 No.3

        We investigated the influence of blistering on $Al_2O_3$/SiON stacks and $Al_2O_3$/SiNx:H stacks passivation layers. $Al_2O_3$ film provides outstanding Si surface passivation quality. $Al_2O_3$ film as the rear passivation layer of a p-type Si solar cell is usually stacked with a capping layer, such as $SiO_2$, SiNx, and SiON films. These capping layers protect the thin $Al_2O_3$ layer from an Al electrode during the annealing process. We compared $Al_2O_3$/SiON stacks and $Al_2O_3$/SiNx:H stacks through surface morphology and minority carrier lifetime after annealing processes at $450^{\circ}C$ and $850^{\circ}C$. As a result, the $Al_2O_3$/SiON stacks were observed to produce less blister phenomenon than $Al_2O_3$/SiNx:H stacks. This can be explained by the differences in the H species content. In the process of depositing SiNx film, the rich H species in $NH_3$ source are diffused to the $Al_2O_3$ film. On the other hand, less hydrogen diffusion occurs in SiON film as it contains less H species than SiNx film. This blister phenomenon leads to an increase insurface defect density. Consequently, the $Al_2O_3$/SiON stacks had a higher minority carrier lifetime than the $Al_2O_3$/SiNx:H stacks.

      • KCI등재

        N형 양면 수광 태양전지를 위한 레이저 공정의 후면 패시베이션 적층 구조 영향성

        김기륜,장효식,Kim, Kiryun,Chang, Hyo Sik 한국재료학회 2020 한국재료학회지 Vol.30 No.5

        In this paper, we investigated the effect of the passivation stack with Al<sub>2</sub>O<sub>3</sub>, hydrogenated silicon nitride (SiN<sub>x</sub>:H) stack and Al<sub>2</sub>O<sub>3</sub>, silicon oxynitride (SiON<sub>x</sub>) stack in the n type bifacial solar cell on monocrystalline silicon. SiNx:H and SiON<sub>x</sub> films were deposited by plasma enhanced chemical vapor deposition on the Al<sub>2</sub>O<sub>3</sub> thin film deposited by thermal atomic layer deposition. We focus on passivation properties of the two stack structure after laser ablation process in order to improve bifaciality of the cell. Our results showed SiN<sub>x</sub>:H with Al<sub>2</sub>O<sub>3</sub> stack is 10 mV higher in implied open circuit voltage and 60 ㎲ higher in minority carrier lifetime than SiON<sub>x</sub> with Al<sub>2</sub>O<sub>3</sub> stack at Ni silicide formation temperature for 1.8% open area ratio. This can be explained by hydrogen passivation at the Al<sub>2</sub>O<sub>3</sub>/Si interface and Al<sub>2</sub>O<sub>3</sub> layer of laser damaged area during annealing.

      • SCOPUSKCI등재

        실리콘 전하선택접합 태양전지 적용을 위한 원자층 증착법으로 증착된 VO<sub>x</sub> 박막의 특성

        박지혜,장효식,Park, Jihye,Chang, Hyo Sik 한국재료학회 2020 한국재료학회지 Vol.30 No.12

        Silicon heterojunction solar cells can achieve high conversion efficiency with a simple structure. In this study, we investigate the passivation characteristics of VOx thin films as a hole-selective contact layer using ALD (atomic layer deposition). Passivation characteristics improve with iVoc (implied open-circuit voltage) of 662 mV and minority carrier lifetime of 73.9 µs after post-deposition annealing (PDA) at 100 ℃. The improved values are mainly attributed to a decrease in carbon during the VOx thin film process after PDA. However, once it is annealed at temperatures above 250 ℃ the properties are rapidly degraded. X-ray photoelectron spectroscopy is used to analyze the chemical states of the VOx thin film. As the annealing temperature increases, it shows more formation of SiOx at the interface increases. The ratio of V5+ to V4+, which is the oxidation states of vanadium oxide thin films, are 6:4 for both as-deposition and annealing at 100 ℃, and 5:5 for annealing at 300 ℃. The lower the carbon content of the ALD VOx film and the higher the V5+ ratio, the better the passivation characteristics.

      • KCI등재

        산처리와 일방향 응고를 이용한 실리콘 정제

        음정현,장효식,김형태,최균,Eum, Jung-Hyun,Chang, Hyo-Sik,Kim, Hyung-Tae,Choi, Kyoon 한국결정성장학회 2008 한국결정성장학회지 Vol.18 No.6

        최근 실리콘 원료의 부족에 따른 가격상승으로 인하여 99.9999% 이상의 순도를 지닌 폴리 실리콘을 더 저렴하게 제조하기 위한 연구가 활발히 진행되고 있다. 본 연구에서는 순도 99%의 금속급 실리콘(MG-Si)을 원료로 산처리와 일방향 응고를 통해 고순도로 정제하는 연구를 수행하였다. MG-Si 럼프를 플레너터리 밀로 분쇄한 후 HCl/$HNO_3$/HF 산 수용액에서 처리하였다. 그 결과 Al, Fe, Ca, Mn 등과 같은 금속 불순물들의 실리콘 내 함량이 크게 감소하면서 실리콘의 순도는 99.995%까지 향상되었다. 정제된 실리콘 분말을 성형한 후 HEM로를 이용하여 용융시킨 뒤, 일방향 응고를 통하여 잉곳을 제조하였다. 성장시킨 다결정 실리콘 잉곳은 $0.3{\Omega}{\cdot}cm$의 비저항과 $3.8{\mu}{\cdot}sec$의 열 운반자 소멸시간(minority carrier life time)을 나타내었다. Recently the shortage of silicon resources especially for poly-silicon of purity higher than 99.9999% leads to search for the more cheap and quick synthesizing routes for silicon feedstock. In order to solve this situation, we investigated the purification process of metallurgical grade (MG) silicon of purity around 99% by the acid leaching and following the unidirectional solidification. MG-Si lumps are pulverized with a planetary mill, and then leached with HCl/$HNO_3$/HF acid solution. As a result, the concentration of metal impurities including Al, Fe, Ca, Mn, etc. decreased dramatically. This process led to silicon content higher than 99.99%. The purified silicon powders were compacted and have been melted and uni-directionally solidified with heat exchange method (HEM) furnace. The properties of multicrystalline silicon ingots were specific resistance of $0.3{\Omega}{\cdot}cm$ and minority carrier life time (MCLT) of $3.8{\mu}{\cdot}sec$.

      • KCI등재

        다양한 조건의 플라즈마 원자층 증착법으로 증착된 Mo 금속의 전기적 특성

        임태완,장효식,Lim, Taewaen,Chang, Hyo Sik 한국재료학회 2019 한국재료학회지 Vol.29 No.11

        Molybdenum is a low-resistivity transition metal that can be applied to silicon devices using Si-metal electrode structures and thin film solar cell electrodes. We investigate the deposition of metal Mo thin film by plasma-enhanced atomic layer deposition (PE-ALD). $Mo(CO)_6$ and $H_2$ plasma are used as precursor. $H_2$ plasma is induced between ALD cycles for reduction of $Mo(CO)_6$ and Mo film is deposited on Si substrate at $300^{\circ}C$. Through variation of PE-ALD conditions such as precursor pulse time, plasma pulse time and plasma power, we find that these conditions result in low resistivity. The resistivity is affected by Mo pulse time. We can find the reason through analyzing XPS data according to Mo pulse time. The thickness uniformity is affected by plasma power. The lowest resistivity is $176{\mu}{\Omega}{\cdot}cm$ at $Mo(CO)_6$ pulse time 3s. The thickness uniformity of metal Mo thin film deposited by PE-ALD shows a value of less than 3% below the plasma power of 200 W.

      • KCI등재

        광유도도금을 이용한 스크린 프린팅 결정질 실리콘 태양전지의 효율 향상

        정명상,강민구,장효식,송희은,Jeong, Myeong Sang,Kang, Min Gu,Chang, Hyo Sik,Song, Hee-Eun 한국전기전자재료학회 2013 전기전자재료학회논문지 Vol.26 No.3

        Screen printing is commonly used to form the front/back electrodes in silicon solar cell. But it has caused high resistance and low aspect ratio, resulting in decreased conversion efficiency in solar cell. Recently the plating method has been combined with screen-printed c-Si solar cell to reduce the resistance and improve the aspect ratio. In this paper, we investigated the effect of light induced silver plating with screen-printed c-Si solar cells and compared their electrical properties. All wafers were textured, doped, and coated with anti-reflection layer. The metallization process was carried out with screen-printing, followed by co-fired. Then we performed light induced Ag plating by changing the plating time in the range of 20 sec~5min with/without external light. For comparison, we measured the light I-V characteristics and electrode width by optical microscope. During plating, silver ions fill the porous structure established in rapid silver particle sintering during co-firing step, which results in resistance decrease and efficiency improvement. The plating rate was increased in presence of light lamp, resulting in widening the electrode with and reducing the short-circuit current by shadowing loss. With the optimized plating condition, the conversion efficiency of solar cells was increased by 0.4% due to decreased series resistance. Finally we obtained the short-circuit current of 8.66 A, open-circuit voltage of 0.632 V, fill factor of 78.2%, and efficiency of 17.8% on a silicon solar cell.

      • KCI등재후보

        물질이동 억제 버퍼층 형성을 통한 페로브스카이트 태양전지 장기 안정성 확보

        배미선,정민지,장효식,양태열,Bae, Mi-Seon,Jeong, Min Ji,Chang, Hyo Sik,Yang, Tae-Youl 한국마이크로전자및패키징학회 2021 마이크로전자 및 패키징학회지 Vol.28 No.3

        페로브스카이트 태양전지는 용액공정으로 제작되어 공정 중 전구체 조성제어를 통해 밴드갭을 용이하게 조절할 수 있다. 탠덤 태양전지의 상부셀로 활용하여 실리콘 태양전지와 접합 시 30% 이상의 효율 달성이 가능하지만, 페로브스카이트 태양전지의 낮은 안정성이 상용화의 걸림돌로 작용하고 있다. 아이오딘 이온 및 전극 물질 확산이 주된 열화기구로 알려져 있어 장기 안정성을 확보하기 위해서는 이러한 이온 이동의 방지가 필요하다. 본 연구에서는 층간소재와 페로브스카이트 광활성층 사이의 이온이동에 의한 열화현상을 관찰하고, 이를 억제하기 위해 페로브스카이트 소재와 은전극 사이에 버퍼층을 도입하여 소자의 안정성을 확보하였다. 85℃에서 300시간 이상 보관 시 버퍼가 없는 소자는 페로브스카이트 층이 PbI<sub>2</sub> 및 델타상으로 변화하며 변색되었으며 AgI가 형성되는 것을 확인했다. LiF와 SnO<sub>2</sub> 버퍼 도입 시 이온이동 억제 효과를 통해 페로브스카이트 태양전지의 열안정성이 향상되었다. LiF버퍼층 적용 및 봉지를 한 소자는 85℃-85%RH damp heat 시험 200시간 후 효율감소가 발생하지 않았으며 추가로 AM 1.5G-1SUN 하에서 최대출력점을 추적하였을 때 200시간 후 초기 효율의 90% 이상 유지하는 것을 확인했다. 이 결과는 버퍼층 형성을 통한 층간 물질이동 억제가 장기안정성을 확보하기 위한 필요조건임을 보여준다. Perovskite solar cells (PSCs) can be fabricated through solution process economically with variable bandgap that is controlled by composition of precursor solution. Tandem cells in which PSCs combined with silicon solar cells have potential to reach high power conversion efficiency over 30%, however, lack of long-term stability of PSCs is an obstacle to commercialization. Degradation of PSCs is mainly attributed to the mass transport of halide and metal electrode materials. In order to ensure the long-term stability, the mass transport should be inhibited. In this study, we confirmed degradation behaviors due to the mass transport in PSCs and designed buffer layers with LiF and/or SnO<sub>2</sub> to improve the long-term stability by suppressing the mass transport. Under high-temperature storage test at 85℃, PSCs without the buffer layers were degraded by forming PbI<sub>2</sub>, AgI, and the delta phase of the perovskite material, while PSCs with the buffer layers showed improved stability with keeping the original phase of the perovskite. When the LiF buffer and encapsulation were applied to PSCs, superior long-term stability on 85℃-85% RH dump heat test was achieved; efficiency drop was not observed after 200 h. It was also confirmed that 90.6% of the initial efficiency was maintained after 200 hours of maximum power tracking test under AM 1.5G-1SUN illumination. Here, we have demonstrated that the buffer layer is essential to achieve long-term stability of PSCs.

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