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이호철(Hocheol Lee),이남영(Namyoung Lee),송창규(Changkyu Song),박천홍(Chunhong Park),이후상(Husang Lee) 대한기계학회 2005 대한기계학회 춘추학술대회 Vol.2005 No.5
In this paper, we suggest a polishing head with a mechanical gimbals-like structure for the optics fabrication. In the small tool polishing processes, several types of polishing mechanism have been tried to get more deterministic and high efficient optical fabrication. The conventional polishing processes to use the contacting pad material of polyurethane or pitch need the higher polishing rate to shorten the overall polishing time for large optics. Therefore, new polishing head mechanism is designed to use the air backpressure and gimbals-like hinge structure to increase polishing velocity. In the following experiment, mechanical adaptability was confirmed both on the flat glass and the convex aluminum surface.
송창규(Chang Kyu Song),이후상(Husang Lee),박천홍(Chun Hong Park),이호철(Hocheol Lee) 한국생산제조학회 2007 한국공작기계학회 춘계학술대회논문집 Vol.2007 No.-
The large optics in the telescope need an extreme level of both form accuracy and surface roughness such as sub-nanometer. To get the large optics of high quality surface, our strategic approach is to make a hybrid and complex machine with grinding, polishing, and measurement function. Therefore, the machine is being equipped with the ELID grinding and the computer-controlled polishing and the optics interferometer module to manufacture a large optics in short cycle. Its current goal is pursuing to acquire a large mirror optics of diameter 1.5m and final form accuracy is λ/10(50㎚) rms. In this paper to show our first result, we described machine design process by the error budget analysis and the conceptual arrangement of machine modules and machine structure and positioning performance was experimentally verified.
전자빔 가공기용 진공 5 축 스테이지의 제어 및 운동특성
이찬홍(Chan-Hong Lee),박천홍(Chun-Hong Park),이후상(Husang Lee) 한국정밀공학회 2004 한국정밀공학회 학술발표대회 논문집 Vol.2004 No.10월
The ultra precision machining in industrial field are increased day by day. The diamond turning has been used generally, but now is faced with limitation of use, because of higher requirement of production field. The electron beam lithography is alternative in machining area as semiconductor production. For EB lithography, 5 axis vacuum stage is required to duplicate small and large patterns on wafer. The stage is composed of 2 rotational axis and 3 translational axis with 5 DC servo motors. The positioning repeatability and resolution of Z axis feed unit are 3.21㎛ and 0.5㎛/step enough to apply to lithography.