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표면미세가공기술을 이용한 수평감지방식의 정전용량형 다결정 실리콘 가속도계의 설계, 제작 및 가공 오차 영향 분석
김종팔,한기호,조영호,Kim, Jong-Pal,Han, Gi-Ho,Jo, Yeong-Ho 대한기계학회 2001 大韓機械學會論文集A Vol.25 No.3
We investigate a surface-micromachined capacitive accelerometer with the grid-type electrodes surrounded by a perforated proof-mass frame. An electromechanical analysis of the microaccelerometer has been performed to obtain analytical formulae for natural frequency and output sensitivity response estimation. A set of prototype devices has been designed and fabricated based on a 4-mask surface-micromachining process. The resonant frequency of 5.8$\pm$0.17kHz and the detection sensitivity of 0.28$\pm$0.03mV/g have been measured from the fabricated devices. The parasitic capacitance of the detection circuit with a charge amplifier has been measured as 3.34$\pm$1.16pF. From the uncertainty analysis, we find that the major uncertainty in the natural frequency of the accelerometer comes from the micromachining error in the beam width patterning process. The major source of the sensitivity uncertainty includes uncertainty of the parasitic capacitance, the inter-electrode gap and the resonant frequency, contributing to the overall sensitivity uncertainty in the portions of 75%, 14% and 11%, respectively.
Methylchlorosilanes의 직접 생산 반응에서 반응기구
김종팔 ( Jong Pal Kim ),이광현 ( Kwang Hyun Lee ) 한국화학공학회 2018 Korean Chemical Engineering Research(HWAHAK KONGHA Vol.56 No.2
구리 촉매를 이용하여 실리콘으로부터 기체상태의 methylchlorosilanes을 직접 생성하는 공정이 Rochow에 의해 제시되었고 이 후로 직접 생산 반응에 관하여 많은 연구가 진행되어 오고 있다. 직접 반응 촉매로서의 구리 외에 조촉매들을 첨가함으로서 반응의 활성을 증가시키고, 주 생산물인 DMDC 로의 선택도를 증가시키는 연구도 많이 보고되었다. 하지만 반응 기구에 있어서는 DMDC 의 생성을 설명하는 연구 외에 부산물로 함께 생성되는 여러 종류의 methylchlorosilanes 들의 생성과정을 설명하는 연구는 없는 실정이다. 그래서 본 연구에서는 실리콘 표면에 존재하는 것으로 보여지는 실리콘 활성점인 =SiCl<sub>2</sub>와 =Si(CH<sub>3</sub>)Cl의 존재를 제시하고 이 활성점 들에 메틸, 염소 및 수소가 첨가되어 methylchlorosilanes이 생성된다고 간주하였다. Methyl chloride (CH<sub>3</sub>Cl)의 해리 흡착으로 인한 메틸-실리콘 결합의 생성과 해리 흡착한 후 표면에 존재하여 표면 이동을 하는 것으로 간주되는 Cl와 H을 이용하여 각 silanes 의 생성 경로를 제시하였다. 제시된 각 silanes 들의 생성 경로는 반응 결과 생성된 각 silanes의 종류뿐만 아니라 TPD 과정에서 생성되는 silanes 종류의 생성도 정확하게 설명해 주고 있다. Direct synthesis of methylchlorosilanes was developed by Rochow with addition of copper on the silicon surface as a catalyst and many research were followed. Most of research were focused on the increase of reaction activity through addition of promoters and concentrated on the increase of selectivity of DMDC. However, there are very few studies about the reaction mechanism. Although formation of DMDC was explained in literature, formation of other silanes were not mentioned at all. This reseach focused on the explanation about formation of all silanes obtained during direct reaction and TPD. Reaction paths were proposed by means of dissociative adsorption of methyl chloride and spillover of surface Cl and H. Surface silicon sites were considered as =SlCl<sub>2</sub> and =Sl(CH<sub>3</sub>)Cl. The synthesis of all methylchlorosilanes were explained by the adsorption of methyl group on the silicon sites and by the surface diffusion of nearby Cl and H. The proposed reaction mechanism explains the formation of all silanes during the reaction and also during the TPD process.
경화촉진제 및 마쇄 이수석고 첨가에 의한 β- 반수석고의 수화응결 특성
최정봉,김종팔 ( Jeong Bong Choi,Jong Pal Kim ) 한국공업화학회 1997 공업화학 Vol.8 No.5
석고의 경화촉진제로 Al₂(SO₄)₃을 첨가하고 ball mill 분쇄한 2종류의 이수석고(인산 이수석고, 화학이수석고)의 첨가량에 따른 β-반수석고의 수화응결 및 유동성, 압축강도, 수화상태등에 미치는 영향을 파악하였다. 7%로 희석한 Al₂(SO₄)₃를 β-반수석고에 15wt% 첨가시 수화응결은 무첨가시보다 초결 및 종결시간이 크게 단축되었다. 마쇄인산 이수석고및 화학 이수석고의 첨가시 수화응결은 인산 이수석고의 분쇄시간 및 첨가량 증가에 따라 초결 및 종결시간이 현저히 단축되었으며 특히, 마쇄 인산이수석고의 첨가에 의한 효과가 더 크게 나타났다. 마쇄인산 이수석고와 화학 이수석고가 첨가된 β-반수석고의 압축강도는 1, 3일의 초기 재령에서 크게 증진되었고 특히, 화학 이수석고에 비하여 마쇄인산 이수석고의 첨가로 β-반수석고 경화체의 초기 압축강도가 15∼20% 증가되었다. When Al₂(SO₄)₃ as an accelerator was added to β-hemihydrate gypsum, the setting time, mobility and compressive strength prorperties of β-hemihydrate gypsum were examined with the adding of two types grounded gypsum crushed by ball mill. By 15wt% adding of 7% Al₂(SO₄)₃ dilute solution, the setting time of β-hemihydrate gypsum was sharply accelerated than that of non-added β-hemihydrate gypsum. When ground phospho gypsum(PG) and chemical gypsum(CG) were added to β-hemihydrate gypsum, the initial and final setting time of β-hemihydrate gypsum were accelerated markedly with the increasing of grinding time and added amount of ground phospho gypsum. Especially, this trend largely presented when ground phospho gypsum was added to β-hemihydrate gypsum. The compressive strength of β-hemihydrate gypsum added by ground phospho and chemical gypsum was largely increased at initial curing time such as 1, 3 days. Particularly, the compressive strength of β-hemihydrate gypsum added by ground phospho gypsum was increased by 15-20% than that of ground chemical gypsum.
전처리공정이 다른 아크릴폐수의 처리수를 세라믹 한외여과막과 역삼투막공정에의 적용
이광현 ( Kwang Hyun Lee ),김종팔 ( Jong Pal Kim ),이종백 ( Jong Baek Lee ) 한국물환경학회 2002 한국물환경학회지 Vol.18 No.6
The application of ceramic ultrafiltration membrane and reverse osmosis membrane using acrylic wastewater treated by photo-catalyst pretreatment and coagulant-filter-neutralization pretreatment processes was discussed with the variation of applied pressure and temperature. Turbidity were shown high removal efficiency in ceramic ultrafiltration membrane process using photo-catalyst pretreatment and coagulant-filter-neutralization pretreatment, It was shown that TDS was highly affected with the variation of applied pressure. Removal efficiency of COD with ceramic ultrafiltration membrane was better with the acrylic wastewater by coagulant-filter-neutralization pretreatment than acrylic wastewater by photo-catalyst pretreatment.
Extended SBM 공정을 이용하여 단일 실리콘 기판상에 제작된 새로운 z축 가속도계
고형호 ( Hyoung Ho Ko ),김종팔 ( Jong Pal Kim ),박상준 ( Sang Jun Park ),곽동훈 ( Dong Hun Kwak ),송태용 ( Tae Yong Song ),조동일 ( Dong Il Cho ),허건수 ( Kun Soo Huh ),박장현 ( Jahng Hyon Park ) 한국센서학회 2004 센서학회지 Vol.13 No.2
N/A This paper presents a novel z-axis accelerometer with perfectly aligned vertical combs fabricated using the extended sacrificial bulk micromachining (extended SBM) process. The z-axis accelerometer is fabricated using only one 1111) SOI wafer and two photo masks without wafer bonding or CMP processes as used by other research efforts that involve vertical combs. In our process, there is no misalignment in lateral gap between the upper and lower comb electrodes, because all critical dimensions including lateral gaps are defined using only one mask. The fabricated accelerometer has the structure thickness of 30 gm, the vertical offset of 12 gm, and lateral gap between electrodes of 4 gm. Torsional springs and asymmetric proof mass produce a vertical displacement when an external z-axis acceleration is applied, and capacitance change due to the vertical displacement of the comb is detected by charge-to-voltage converter. The signal-to-noise ratio of the modulated and demodulated output signal is 80 dB and 76.5 dB, respectively. The noise equivalent input acceleration resolution of the modulated and demodulated output signal is calculated to be 500 gg and 748.tg. The scale factor and linearity of the accelerometer are measured to be 1.1 mV/g and 1.18% FSO, respectively.