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혈액투석중인 만성신부전 환자의 사망률에 영향을 미치는 요인부석
김경석(K . S . Kim),김진구(J . G . Kim),우상태(S . T . Woo),서상렬(S . Y . Suh),김향(H . Kim),권영주(Y . J . Kwon),표희정(H . J . Pyo),김용섭(Y . S . Kim),차대룡(D . R . Cha),조원용(W . Y . Jo),김형규(H . K . Kim),김창수(C . S . Kim),박 대한내과학회 1998 대한내과학회지 Vol.54 No.3
N/A Background: Several factors have been influenced to mortality of patients with end-stage renal disease treated with hemodialysis. We performed this study to evaluate the factors influencing to mortality in chronic hemodialysis patients in eight hemodialysis centers. Method: We analyzed retrospectively the demographic characteristics, risk stratification, Kamofsky scale, regularly tested laboratory finding(CBC, Blood chemistry), hospitalization rate, and gross mortality among 150 patients from June, 1994 to June 1996. Results: 1) A total of 150 patients were enrolled, male 91 and female 59 and mean age was about 53 years. 43 patients had diabetes and 107 patients had nondiabetes. The mean duration of hemodialysis was 48.2±24.7 months(range, 9-123months), 2) 82 patients(54.7%) required hospitalization during the 2 year follow-up period and the most common cause of hospitalization was cardiovascular disease. 3) A total of 43 patients(28.7%) had been died during the 2 year follow-up period and the most common cause of death was cerebrovascular disease. 4) In univariate analysis, advancing age, Kamofsky scale(<80 points), diabetic nephropathy as the underlying cause of ESRD, comorbid illness, high risk group in risk stratification, total HD duration, HD length per week, low serum albumin and creatitine concentration were all associated with significantly increased risk of death. In multivariate analysis, diabetic nephropathy as the underlying cause of ESRD and low serum albumin concentration were more highly associated with death probability. Conclusion: We conclude that diabetic nephropathy as underlying cause of ESRD and serum albumin concentration are more important elements in determining patient mortality.
김종억(J.E.Kim),김용섭(Y.S.Kim) 한국자동차공학회 1984 오토저널 Vol.6 No.1
We appleis Molecular Dynamics simulation technics to a system of Lennard-Jones potential interacting Argon liquid to study shear flow behavior . <br/> The thermodynamic state of the system is ρ=35.54 Kgㆍmole/㎥,<br/> T=86.5˚K which is the triple point of Argon liquid. We applies shear rate :ε=9.26×10˚1/sec in the system. <br/> We find the response function shear viscosity changes, and shear rate build-up as a func-tion lf tine. We also find the thermal conductivity in a soft-sphere system.
Electron Cyclotron Resonance O_2 Plasma에서 증착한 규소 산화 박막의 특성
안명환,서문석,장재선,서성모,이기방,윤창주,이형재,남기석,최규현,손춘배,김용섭,강석희 全北大學校 基礎科學硏究所 1994 基礎科學 Vol.17 No.-
규소 산화막을 ECR-CVD(electron cyclotron resonance-chemical vapor deposition) 증착방법으로 5인치 기판위에 상온에서 증착하고, 증착공정조건인 증착율, 기판온도, 마이크로파의 세기변화 및 플라즈마 혼합기체의 비에 따른 규소 산화막의 특성을 조사하였다. 또한 산화막의 구조적인 특성을 비교하기 위해 FTIR을 이용하여 ECR-CVD 증착한 산화막, RPE-CVD(remote plasma enhanced-CVD) 증착한 산화막 및 열 산화막의 stretching frequency를 측정하였다. 측정된 결과 ECR-CVD로 증착된 산화막이 구조적인 면에서 열 산화막과 거의 같음을 보였다. ECR-CVD로 증착된 산화막의 전기적인 특성을 전류-전압 및 축전-전압 측정에의하여 분석하였다. 축전된 산화막의 전기적인 특성은 산화막의 전하 밀도는 1×10 exp (11)/㎠이였고, 평균 절연 파괴 전압은 약 6 MV/㎝이다. We have grown thin films of SiO_2 at room temperature by using an ECR-CVD system and have investigated the changes in the properties of the deposited films with changes in the processing conditions such as the deposition rate, the substrate temperature, the microwave power and the plasma gas mixing ratio. We also measured the stretching frequency of three kinds of oxides, and ECR-CVD-grown oxide, a PECVD-grown oxide, and a thermally grown oxide, using FTIR analysis to compare their structural properties. The result shows that the structural properties of the ECR-grown oxide are similar to those of the thermally grown oxide. Additionally, the electrical properties of the ECR-grown oxide were investigated by using current-voltage and capacitance-voltage measurements. These electrical results indicate that the oxide charge density and the average breakdown voltage are 1×10 exp (11) ㎝^-2 and 6 MV/㎝, respectively.