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Photo-thermal-chemical Reaction Process of Tungsten Oxide for Electrochromic Application
H. Cho(조현민),J. Kwon(권진형),W. S. Lee(이원섭),W. S. Chang(장원석),S. H. Ko(고승환) Korean Society for Precision Engineering 2021 한국정밀공학회 학술발표대회 논문집 Vol.2021 No.11월
A Direct laser write (DLW) process has broadened a novel patterning method for advanced electronic device fabrication. The DLW process bases on the photo-thermal-chemical reaction and features such as high precision, fast processing, and room temperature processability without inert gas. Before, the process scalability of the interaction between the nanomaterials and laser has been examined on the various conductive metal nanomaterials such as gold, silver, and copper. Although the direct laser writing process has shown many achievements on the metal nanomaterials, it has rarely been researched for the laser-material interaction of the metal oxide nanomaterials. In this study, WOx metal oxide material employs the DLW process for post-processing which enables patterning and annealing simultaneously with inducing photo-chemical redox reaction as well as photo-thermal effect. The DLW-processed WO₃ thin film has shown similar electrochemical performances for the electrochromic application to the thermal annealed WO₃ thin film. We have demonstrated a facile and fast fabrication of the electrochromic device (ECD) with the DLW-processed WO₃ thin film layer.