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김진석(J.S. Kim),김한수(H.S. Kim),이동윤(D.Y. Lee),이석우(S.W. Lee),강은구(E.G. Kang) 한국생산제조학회 2011 한국생산제조시스템학회 학술발표대회 논문집 Vol.2011 No.4
In recently, trends of the miniaturization of micro parts machining pattern by laser machining methods have been emerged. However, the conventional laser processing methods have limitations on the resolution. So, e-beam process has been considered as alternatives. Especially, e-beam lithography has been taken accounted of tools for micro and nano pattern. But e-beam lithography equipment have some disadvantages such as lower productivity and smaller processing area etc. than other micro parts machining tools. Therefore we have carried out the development of micro column electron beam lithography equipment for achieving the more higher productivity, lager processing area, and also higher resolution. And then we tried to develop e-beam lithography system with micro column type and using wafer lens for multi column e-beam lithography system and modular e-beam lithography unit. In this paper, we developed the electro static lens system, composed of accelerator lens, condenser lens, objective lens, beam blanker, stigmator and deflector.
남성호(S.-H. Nam),홍원표(W.-P. Hong),강은구(E.-G. Kang),이석우(S.-W. Lee),최헌종(H.-Z. Choi) 대한기계학회 2008 대한기계학회 춘추학술대회 Vol.2008 No.5
Small and medium-sized enterprises should collaborate with themselves to reduce the cost and delivery, and to increase the productivity. Collaborative IT infrastructure like as e-Manufacturing collaborative hub system became more essential parts in their business among the enterprises. Furthermore, the enterprises using the hub system also require their own services corresponding to each enterprise-oriented business role. In this study, the component-based collaborative infrastructure is presented to take into account the support of collaboration services as well as the integration of business process. It has been also investigated that this infrastructure is advantageous to configure the enterprise-customized collaboration systems and to immediately support the system for the enterprises.
강은구(E.G. Kang),최병열(B.Y. Choi),이석우(S. W. Lee),홍원표(W.P. Hong),최헌종(H.Z. Choi) 한국정밀공학회 2004 한국정밀공학회 학술발표대회 논문집 Vol.2004 No.10월
The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper was carried out some experiments and verifications of mechanism on FIB-CVD using SMI8800 made by Seiko. FIB-CVD has in fact proved to be commercially useful for repair processes because the beam can be focused down to 0.05㎛ dimensions and below and because the same tool can be used to sputter off material with sub-micrometer precision simply by turning off the gas ambient. Recently the chemical vapour deposition induced ion beam has been required more deposition rate and accurate pattern because of trying to manufacture many micro and nano parts. Therefore this paper suggested the optimization parameters and discussed some mechanism of chemical vapour deposition induced ion beam on FIB-CVD for simple pattern.