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      • Invited Lectures : Thln fllm Formation and anoparttcle Production by nsing Flash-boiling Spray

        ( Motohiro Oshimal ) 한국액체미립화학회 2012 한국액체미립화학회 학술강연회 논문집 Vol.2012 No.-

        A method for controlling evaporation by using chemical vapor deposition (CVD) with a mixed solution, called “flashing spray CVD” is proposed. As for this method, a mixed solution is transported through an injector installed at the top of the vacuum CVD chamber. The solution is evaporated by flashing when its pressure is below the saturated pressure of the solution, leading to formation of a lean, homogeneous vapor. This homogeneous vapor is then reacted with oxygen to form a film. In this paper, we describe the research result about flashing spray CVD. The characteristics of the flashing spray were investigated at cvd ambient pressure by magnified photography and, LIF and Mie scattering. Tetraethoxysilane (TEOS) was used as the precursor, and the best low-boiling-point organic solvent was selected for mutual solubility of the low-boiling-point organic solvent and TEOS and to improve the vaporization characteristics of TEOS. The best injector shape for a particular injection condition was selected on the basis of vapor-formation speed and distribution by means of optical measurements. Homogeneous SiO2 films could be formed on 200-and 300-mm-diameter wafers by flashing spray CVD. And a novel method for forming nanoparticles by using a flash-boiling spray was also developed. This method applies flashing spray CVD to flame synthesis. We also describe TiO2 nanoparticles production by this method.

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