“THE FORMATION OF NAMSADANG (KOREAN ITINERANT PERFORMER) TROUPES”: CHAPTER ONE OF A STUDY OF NAMSADANG TROUPES

SIM USŎNG,NATHAN HESSELINK 계명대학교 한국학연구원 2006 Acta Koreana Vol.9 No.2

The namsadang represent a professional class of traveling entertainers that flourished during the eighteenth and nineteenth centuries in Korea. With deep roots in ritual practices and itinerant troupe performance culture, the namsadang in many ways served the role of mass entertainment for their rural, pre-modern Korean audiences. These artistic troupes were composed exclusively of males, and during the height of their activity they featured performances of percussion music and dance, bowl spinning, acrobatics, tightrope walking, mask dance, and puppetry. Although the namsadang were mistrusted and despised by the ruling elite, they were largely embraced by the commoner classes who eagerly awaited their visits to the countryside. The namsadang as an institution came to a close in the mid-twentieth century, under the pressures and other contingencies of the Japanese occupation and the Korean War. A revivalist movement, however, took place beginning in the 1950s with the help and concerted efforts of the activist and folklorist Professor Sim Usŏng. His academic and administrative work helped shed light on the poorly documented past of the namsadang, at the same time elevating their status and appreciation among a modern South Korean population. This article provides a critical translation of the first chapter of his seminal book on the topic, Namsadangp’ae yŏn’gu (A study of namsadang troupes). The translator would like to thank the Korea Foundation for a fieldwork grant that helped support the research necessary for this article.

A Proposal of Blind Signal Separation Algorithm

Using Kurtosis,Shinya Kusakari,Hiroki Matsumoto,Toshihiro Furukawa 대한전자공학회 2003 ITC-CSCC :International Technical Conference on Ci Vol.2003 No.7

Silicon-on-glass 공정에서 접합력 균일도 향상을 위한 고정단 설계

박우성(Usung Park),안준은(Jun Eon An),윤성진(Sungjin Yoon) 대한기계학회 2017 大韓機械學會論文集B Vol.41 No.6

본 논문은 silicon-on-glass(SOG) 공정에서 접합력 균일도 향상을 위한 고정단 설계에 대한 내용을 다룬다. SOG 공정은 전극이 형성된 유리 기판층과 실리콘 구조층의 양극접합을 기반으로 하며, 가속도 센서와 공진형 센서를 비롯한 고종횡비 구조를 갖는 다양한 실리콘 센서들의 제작에 널리 사용된다. 본 논문에서는 전극과 유리 기판층의 표면 사이에 발생하는 단차로 인한 불균일한 접합을 방지하기 위해, 실리콘 구조층에서 유리 기판층과 접합되는 부분과 전극과 겹쳐지는 부분을 트렌치(trench)를 이용해 분리하는 새로운 형상의 고정단을 제안한다. 본 고정단은 추가적인 공정 없이 기존의 SOG 공정으로 제작되는 디바이스들에 손쉽게 적용이 가능하다. In this paper, an anchor design that improves bonding strength uniformity in the silicon-on-glass (SOG) process is presented. The SOG process is widely used in conjunction with electrode-patterned glass substrates as a standard fabrication process for forming high-aspect-ratio movable silicon microstructures in various types of sensors, including inertial and resonant sensors. In the proposed anchor design, a trench separates the silicon-bonded area and the electrode contact area to prevent irregular bonding caused by the protrusion of the electrode layer beyond the glass surface. This technique can be conveniently adopted to almost all devices fabricated by the SOG process without the necessity of additional processes.

WITH CONSECUTIVE REACTION PROCESS WHEN INTRA-PELLET TRANSFER TOOK PLACE-CONCENTRATION PROFILE, EFFECTIVENESS FACTOR : CIRCLE CONSTITUTIONS

WWENW, USung 단국대학교 대학원 1989 學術論叢 Vol.13 No.-

Author attained the concentration profile and effectiveness factor for the consecutive reactions. Author could conclude from the computation that effectiveness factor f^ⅱ to second step altered a lot upto middle range in module Ø^ⅱ when parameter Ø altered, and accessed to the effectiveness factor f^ⅰ for first step for large Ø^ⅱ. When Ø^ⅰ, Ø^ⅱ were high at the same time, f^ⅰ, f^ⅱ were even same. Author could therefore predict f for all the steps in multistep consecutive reactions were same if Ø were high. Wronskian with nonzero for the functions! Particular solutions were therefore, linearly independent.

연구발표논문초록 ( 공정시스템 (2) ) : 전산제어 system의 유동층 반응기에의 적용

한명완 (정),강신이 (정),윤풍 (정) ( Control of Fluidized bed Reactor Using a Microcomputer ) 한국화학공학회 1987 추계학술발표회 Vol.- No.-

Shell crown을 이용하여 기존 국부의치 지대치를 복제한 금관 제작에 관한 연구

임병철 김천대학교 1985 김천대학교 논문집 Vol.6 No.-

A study of the Crown construction using sheel crown made by duplicating the abutmenttooth of the P.O Lim, Byung Chul Abstract From time to time, it is necessary to reconstruct the crown for the abutment tooth of the partial Denture, it has been difficult and lack of accuracy in it’s construction. I studied and discovered a new method of reconstructing the crown, that is rather easir and more accurate than the method bing used, in the following points. 1.It’s good in function and use of the partial Denture ready made, 2.It is good to protect the periodental tissue, and avoid the uneasy feeling, 3.It is so easy and accurate in the procedure of reconstruction, 4.And patient’s charge would be less, because of not reconstructing the partial Denture.

고종횡비 구조물의 정밀 제작을 위한 DRIE 식각 마스크

박우성(Usung Park),안준은(Jun Eon An) 대한기계학회 2017 대한기계학회 춘추학술대회 Vol.2017 No.11

In this paper, a fabrication process which utilizes both photoresist(PR) and silicon oxide layer as etch mask for deepreactive ion etching(DRIE) is presented for forming high-aspect-ratio silicon structures without severe residual stress. An oxide layer was deposited and patterned only critical parts as a pick-off in inertial sensors, then a PR layer was deposited and patterned other parts which are relatively less sensitive to the precision of a pattern. After DRIE process, both etch masks have been removed. The fabricated device using this 2-step mask shows reduced residual stress and more precise structures compared with the device using a conventional single silicon oxide and PR mask, respectively.

고종횡비 구조물의 정밀 제작을 위한 DRIE 식각 마스크

박우성(Usung Park),안준은(Jun Eon An) 대한기계학회 2018 大韓機械學會論文集B Vol.42 No.7

본 논문은 큰 잔류응력의 증가 없이 고종횡비의 정밀 구조물을 제작하기 위해 deep-reactive ion etching(DRIE)의 식각 마스크(etch mask)로 감광수지(photoresist, PR)와 산화실리콘(silicon oxide)을 함께 선택적으로 적용한 제작 공정에 대해 다룬다. 제안되는 식각 마스크의 제작은 두 단계로 나뉘는데, 먼저 관성센서에서 픽오프(pick-off)와 같이 구조물에서 중요한 부분을 산화실리콘으로 형성하고, 이어 표준질량(proof mass)과 같이 상대적으로 형상의 정밀도가 덜 중요한 부분을 PR을 이용해 형성된다. DRIE 공정이후 두 재료의 마스크는 함께 제거된다. 이러한 2종류의 식각 마스크를 적용하여 제작된 디바이스는 기존의 산화실리콘 마스크나 PR 마스크만을 이용해 제작된 디바이스에 비해 각각 상대적으로 감소된 잔류응력과 향상된 패턴 정밀도를 보였다. In this paper, a fabrication process that utilizes both photoresist (PR) and silicon oxide layer etch masks for deep reactive ion etching (DRIE) is presented for manufacturing high-aspect-ratio silicon structures without severe residual stress. An oxide layer was first deposited, and only the critical parts were patterned as a pick-off in inertial sensors. Then, a PR layer was deposited, which patterned the other parts that were relatively less sensitive to the precision of a pattern. After the DRIE process, both etch masks were removed. The device that is fabricated using this two-step mask shows reduced residual stress and more precise structures compared to a device fabricated using the conventional single silicon oxide and PR mask.

A Novel Passive Quasi-Zero Stiffness Isolator for Ultra-Precision Measurement Systems

김장헌,전영준,엄상우,Usung Park,김경수,Soohyun Kim 한국정밀공학회 2019 International Journal of Precision Engineering and Vol.20 No.9

In the paper, a novel passive vibration isolator is proposed for an ultra-precision sensing system, utilizing a quasi-zero stiffness (QZS) mechanism. The QZS mechanism implements the high static low dynamic stiffness, which effectively reduces the dynamic force transmission while minimizing the static deflection under the natural frequency of conventional passive isolator. Furthermore, it does not need any electric components; the mechanism is suitable for the ultra-precision sensing systems measuring extremely weak electromagnetic fields. However, nonlinear stiffness and hysteresis caused from the negative stiffness elements degrade the system performance. A vertical spring with a pre-tension and eight horizontal plate springs with nonlinear buckling characteristics constitute the proposed system to solve these problems. The mathematical model compares the negative stiffness design with previous QZS research. The buckled plate spring with ball joint design reduces stiffness variation. Transmissibility of the proposed system for low frequency range is investigated experimentally.

Silicon-on-glass 공정에서 접합력 균일도 향상을 위한 고정단 설계

안준은(Jun Eon An),박우성(Usung Park),임재욱(Jaewook Rhim) 대한기계학회 2016 대한기계학회 춘추학술대회 Vol.2016 No.12

In this paper, an anchor design which improves bonding strength uniformity is presented for the silicon-on-glass (SOG) process. The SOG process is widely used in conjunction with an electrode-patterned glass substrate as a standard fabrication process for forming high-aspect-ratio movable silicon microstructures in various types of sensors, including inertial and resonant sensors. In the proposed anchor design, a trench lies between and separates the silicon-bonded area and the electrode-contact area to prevent irregular bonding caused by the protrusion of the electrode layer beyond the glass surface. This technique can be conveniently adopted to almost all devices fabricated by the SOG process without the necessity of additional processes.