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김도근,Igor Svadkovski,Seunghun Lee,Jong-Won Choi,Jong-Kuk Kim 한국물리학회 2009 Current Applied Physics Vol.9 No.3
In this work, various nanocomposite Ti–Si–N films have been deposited by hybrid coating system of double bending filtered vacuum arc source (DBFVAS) and magnetron sputtering techniques. Vacuum arc source has been used for the deposition of TiN and Si was incorporated by magnetron sputtering. The magnetic system of double bending filter consists of five solenoid coils and additional coil on the opposite side of vacuum chamber is supporting stabilization of the plasma flow onto substrate surface. Ti–Si–N film is deposited on the Si wafers and high speed steel (HSS) substrates with different Si content, which is controlled by magnetron current. As magnetron current increases from 0 to 1.5 A, Si content increases up to 18.2%. The deposition rate of Ti–Si–N coating layer is up to 17 nm/min. From the results Ti–Si–N coatings have been characterized as nanocomposites, consists of TiN crystallites and amorphous Si3N4. In this work, various nanocomposite Ti–Si–N films have been deposited by hybrid coating system of double bending filtered vacuum arc source (DBFVAS) and magnetron sputtering techniques. Vacuum arc source has been used for the deposition of TiN and Si was incorporated by magnetron sputtering. The magnetic system of double bending filter consists of five solenoid coils and additional coil on the opposite side of vacuum chamber is supporting stabilization of the plasma flow onto substrate surface. Ti–Si–N film is deposited on the Si wafers and high speed steel (HSS) substrates with different Si content, which is controlled by magnetron current. As magnetron current increases from 0 to 1.5 A, Si content increases up to 18.2%. The deposition rate of Ti–Si–N coating layer is up to 17 nm/min. From the results Ti–Si–N coatings have been characterized as nanocomposites, consists of TiN crystallites and amorphous Si3N4.
Kim, D.G.,Svadkovski, I.,Lee, S.,Choi, J.W.,Kim, J.K. Elsevier 2009 Current Applied Physics Vol.9 No.3
In this work, various nanocomposite Ti-Si-N films have been deposited by hybrid coating system of double bending filtered vacuum arc source (DBFVAS) and magnetron sputtering techniques. Vacuum arc source has been used for the deposition of TiN and Si was incorporated by magnetron sputtering. The magnetic system of double bending filter consists of five solenoid coils and additional coil on the opposite side of vacuum chamber is supporting stabilization of the plasma flow onto substrate surface. Ti-Si-N film is deposited on the Si wafers and high speed steel (HSS) substrates with different Si content, which is controlled by magnetron current. As magnetron current increases from 0 to 1.5A, Si content increases up to 18.2%. The deposition rate of Ti-Si-N coating layer is up to 17nm/min. From the results Ti-Si-N coatings have been characterized as nanocomposites, consists of TiN crystallites and amorphous Si<SUB>3</SUB>N<SUB>4</SUB>.