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Chun, Hui-Gon,Sochugov, Nikolay S.,You, Yong-Zoo,Soloviv, Andrew A.,Zakharov, Alexander N, The Korean Society Of Semiconductor Display Techno 2003 한국반도체장비학회지 Vol.2 No.3
Extended unbalanced magnetron sputtering system based on the cylindrical magnetron with a rotating cathode was developed. The unbalanced configuration of magnetic field was realized by means of additional lines of permanent magnets, placed along both sides of a 89 mm outer diameter and 600 mm long cylindrical cathode. The performance of the unbalanced magnetron was assessed in terms of the ion current density and the ion-to-atom ratio incident at the substrate. Furthermore, the paper presents the comparison of the internal plasma parameters, such as the electron temperature, electron density, plasma and floating potentials, measured by a Langmuir probe in various positions from the cathode, for conventional and unbalanced constructions of the cylindrical magnetron. The plasma density and ion current density are about 3-5 times higher than those of conventional one, in the unbalanced magnetron in a 0.24 Pa Ar atmosphere with a DC cathode power of 3 kW.
Chun, Hui-Gon,Oskomov, Konstantin V.,Sochugov, Nikolay S.,Lee, Jing-Hyuk,You, Yong-Zoo,Cho, Tong-Yul The Korean Society Of Semiconductor Display Techno 2003 한국반도체장비학회지 Vol.2 No.1
Plasma generator based on non-self-sustained low-pressure arc discharge has been examined as a tool for deposition of highly-adhesive hydrogenated amorphous diamond-like carbon(DLC) films. Since the discharge is stable in wide range of gas pressures and currents, this plasma source makes possible to realize both plasma-immersion ion implantation(PIII) and plasma-immersion ion deposition(PIID) in a unified vacuum cycle. The plasma parameters were measured as functions of discharge current. Discharge and substrate bias voltage parameters have been determined for the PIII and PIID modes. For PIID it has been demonstrated that hard and well-adherent DLC coating are produced at 200-500 eV energies per deposited carbon atom. The growth rates of DLC films in this case are about 200-300 nm/h. It was also shown that short(∼60$\mu\textrm{s}$) high-voltage(> 1kV) substrate bias pulses are the most favorable for achieving high hardness and good adhesion of DLC, as well as for reducing of residual intrinsic stress are.
Konstantin V. Oskomov,Hui-Gon Chun,Tong-Yul Cho,Nikolay S. Sochugov,Yong-Zoo You 한국진공학회(ASCT) 2002 Journal of Korean Vacuum Science & Technology Vol.6 No.4
Method of plasma-immersion ion deposition of hydrogenated DLC films on relatively thick flat dielectric substrates from plasma of not-self-sustained low-pressure gas arc discharge is suggested. Coating properties have been investigated experimentally, average energy per a deposited carbon atom depending on discharge current has been calculated. Optimum deposition parameters for obtaining sufficiently hard and transparent high-adhesive a-C:H films on a 4-㎜ thick glass substrates have been determined. Possibility to use these coatings for photo-tools protection from abrasion wear at low operating loads is shown in general.