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나노 Imprinting을 위한 몰드 제작에 관한 연구
이진형(Jin-Hyung Lee),임현우(Hyun-Uoo Lim),김태곤(Taegon Kim),이승섭(Seung-Seoup Lee),박진구(Jin-Goo Park),이은규(Eun-Eyu Lee),김양선(Yang-Sun Kim),한창수(Chang-Su Han) 대한기계학회 2003 대한기계학회 춘추학술대회 Vol.2003 No.4
This study aims to investigate the fabrication process of nano silicon mold using electron beam lithography (EBL) to generate the nanometer level patterns by nano-imprinting technology. The nano-patterned mold including 100nm pattern size has been fabricated by EBL with different doses ranged from 22 to 38 μC/cm² on silicon using the conventional polymethymenthacrylate (PMMA) resist. The silicon mold is fabricated with various pattems such as circles, rectangles, crosses, oblique lines and mixed forms. The effect of dosage on pattern density in EBL is discussed based on SEM(Scanning Electron Microscopy) analysis of fabricated molds. The mold surface is modified by hydrophobic fluorocarbon (FC) thin films to avoid the stiction during nano-imprinting process.