http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
Kerr-Lens 모드-록킹되는 티타늄 사파이어 레이저의 대칭형 공진기의 설계와 안정성에 대한 분석
추한태,윤병운,김규욱,이태동 금오공과대학교 산업기술개발연구원 2001 産業技術開發硏究 Vol.17 No.-
Design and theoretical analysis for the spot size and the Kerr-lens mode-locking(KLM) strength can be represented as explicit function of the position in the cavity, the intracavity laser power, and the stability parameter for symmetrical Z-type laser cavity with a four-mirror. The results indicate that the KLM strength achieves its maximum value at the edge of the stability range. Self-amplitude modulation and group-velocity dispersion compensation can be established by using of the intraprism path length and the separation of a prism pair for beam path in the cavity. Also we have compared above theoretical results with the experimental data for our KLM Ti:sapphire laser system, and can obtain the pulse width of 25.7 fs with the FWHM of 33 nm and the repetition rate of 82 MHZ.
IPMs Technology for Inverter-driven Home Appliance Applications
Byoung-Ho Choo,Jun-Bae Lee,Dae-Woong Chung,Jung-Boong Lee,Bum-Seok Suh,Tae-Hoon Kim 전력전자학회 2000 전력전자학술대회 논문집 Vol.2000 No.11
Due to cost-effective and compact system design, IPM-based inverters are now being seen as an attractive alternative to conventional discrete-based inverters technique for low power ac drives, in particular, such as washing machines, refrigerators and air-conditioners. Fairchild-IPM newly developed in order to provide the advantages of the lowest cost and better performance is discussed and its specification is given.
Self-Organized Process for Patterning of a Thin-Film Transistor
Byoung-Kwon Choo,Jin Jang,Gun Jeong Kim,Jung-Su Choi,Kyu-Chang Park 한국물리학회 2006 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.48 No.6
We studied the self-organized patterning of an insulator by using micro-contact printing (μ-CP) with an OTS (octadecyltrichlorosilane)-treated PDMS (polydimethylsiloxane) soft mold. An OTS monolayer on the patterned PDMS was formed by dipping it into an OTS solution. We transferred the OTS monolayer from the PDMS mold to a Cr layer on glass. The OTS monolayer changed the surface from hydrophilic to hydrophobic. We made self-organized PVP (cross-linked poly-4- vinylphenol) patterns by spin-coating of PVP. The PVP can be coated on the hydrophilic surface of Cr, but not on the OTS-treated Cr. Thus, we could get organic patterns without photolithography rapidly, and we could use organic patterns as etch barriers at a low cost. Using the surface energy difference and a self-organized process, we could make a 12-μm-wide organic line pattern easily. Our self-organized process can be used as a patterning method for organic insulators and semiconductors in organic TFTs (thin-film transistors) and as an etch barrier for sub-layer etching in non-organic device fabrication.no=8A