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백수웅(Baek, Su-Ung),양현훈(Yang, Hyeon-Hun),한창준(Han, Chang-Jun),김한울(Kim, Han-Wool),나길주(Na, Kil-Ju),이석호(Lee, Suk-Ho),정해덕(Chung, Hae-Deok),박계춘(Park, Gye-Choon) 한국신재생에너지학회 2010 한국신재생에너지학회 학술대회논문집 Vol.2010 No.06
Selenium 물질은 지구상에 많은 양이 존재하고, 가격이 저렴하다. 그 성질은 분광감도가 시감도에 잘 일치하고, 광학적 특성이 뛰어나서 태양전지로 연구도 활발히 진행 중이다. 본 연구에서는 Se박막을 열저항증착방법을 이용하여 증착시, 기판온도를 변화를 시켜 그 구조적특성의 변화를 관찰하였다. 50?C에서 변화를 시작하여 70?C, 100?C의 변화에서 각각 단사정계, 육방정계 결정구조가 나타났다. XRD 분석결과 100?C에서 증착한 sample의 회절강도가 70?C에서 증착한 sample보다 작은회절강도를 나타내었다. 추후 열처리공정등을 통하여 보완하면, CISe 박막 화합물 태양전지 연구에 큰 효과를 나타낼 수 있을 것으로 예상된다.
양현훈(Hyeon-Hun Yang),백수웅(Su-Ung Baek),나길주(Kil-Ju Na),소순열(Soon-Youl So),박계춘(Gye-Choon Park),이진(Jin Lee),정해덕(Hae-Deok Chung) 대한전기학회 2009 대한전기학회 학술대회 논문집 Vol.2009 No.7
MgF₂ is a current material for the optical applications in the UV and deep UV range. Process variables for manufacturing the MgF₂ thin film were established in order to clarify optimum conditions for growth of the thin film depending upon process conditions , and then by changing a number of vapor deposition conditions and substrate temperature, Annealing conditions variously, structural and Optical characteristics were measured. Thereby, optimum process variables were derived. Nevertheless, modern applications still require improvement of the optical and structural quality of the deposited layers. In the present work, the composition and microstructure of MgF₂ single layers grown on slide glass substrate by Electro beam Evaporator(KV-660) processes, were analyzed and compared. The surface Substrate temperature having an effect on the quality of the thin film was changed from 200[℃] to 350[℃] at intervals of 50[℃]. and annealing temperature an effect on the thin film was changed from 200[℃] to 400[℃] at intervals of 50[℃]. Physical properties of the thin film were investigated at various fabrication conditions substrate temperature, annealing and temperature, annealing time by XRD, FE-SEM.
태양전지용 MgF<sub>2</sub> 반사방지막 특성연구
박계춘(Park, Gye-Choon),양현훈(Yang, Hyeon-Hun),백수웅(Baek, Su-Ung),나길주(Na, Kil-Ju),소순열(So, Soon-Youl),이진(Lee, Jin),정해덕(Chung, Hae-Deok) 한국신재생에너지학회 2009 한국신재생에너지학회 학술대회논문집 Vol.2009 No.11
MgF₂ is a current material for the optical applications in the UV and deep UV range. Process variables for manufacturing the MgF₂ thin film were established in order to clarify optimum conditions for growth of the thin film depending upon process conditions, and then by changing a number of vapor deposition conditions and substrate temperature, Annealing conditions variously, structural and Optical characteristics were measured. Thereby, optimum process variables were derived. Nevertheless, modern applications still require improvement of the optical and structural quality of the deposited layers. In the present work, the composition and microstructure of MgF₂ single layers grown on slide glass substrate by Electro beam Evaporator(KV-660) processes, were analyzed and compared. The surface Substrate temperature having an effect on the quality of the thin film was changed from 200[?C] to 350[?C] at intervals of 50[?C]. and annealing temperature an effect on the thin film was changed from 200[?C] to 400[?C] at intervals of 50[?C]. Physical properties of the thin film were investigated at various fabrication conditions substrate temperature, annealing and temperature, annealing time by XRD, FE-SEM.