http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
반복 발작성 긴장성 두통을 호소하는 소양인(少陽人) 태음인(太陰人) 치험 2례
박병주,신현상,강미정,이지원,장현수,이준희,이의주,고병희,Park, Byung-Joo,Shin, Hyun-Sang,Kang, Mi-Jeong,Lee, Ji-Won,Jang, Hyun-Su,Lee, Jun-Hee,Lee, Eui-Ju,Koh, Byeong-Hee 사상체질의학회 2010 사상체질의학회지 Vol.22 No.2
1. Objectives: This study reports two cases of repetitive episodic tension-type headache patients who were each constitutionally typed as the Taeeum type and the Soyang type and respectively treated with Yanggyeoksanhwa-tang and Galgeunhaegi-tang. 2. Methods: The patients' subjective and objective symptoms were observed daily, and the VAS scores for the main symptoms were recorded daily throughout hospitalization period. When deemed necessary, other assessment tools were engaged (Migraine-Specific Quality of Life questionnaire, Migraine Disablity Assessment questionnaire, Headache Impact Test-6, etc.). 3. Results: The Soyang Type patient's headache improved by the end of hospitalization, with a dramatic drop in the VAS score from VAS 10 to VAS 2. The Taeeum Type patient's headache also showed improvement, with an equally dramatic decrease in the VAS score from VAS 10 to VAS 2. 4. Conclusion: Although the two patients were experiencing the same symptoms of repetitive episodic tension-type headache, they were each given different medicinal interventions in accordance to their respective constitutional types. This series of cases is notable in that the two widely different medications (Yanggyeoksanhwa-tang and Galgeunhaegi-tang) were applied to specifically conforming pathologies (the Sogal symptomatology and the Ganyeol symptomatology, respectively) to produce equally dramatic improvements.
그래핀 하부전극을 이용하여 BMNO 케페시터의 특성 향상을 위한 Ti Adhesion Layer의 효과
박병주,윤순길,Park, Byeong-Ju,Yoon, Soon-Gil 한국전기전자재료학회 2013 전기전자재료학회논문지 Vol.26 No.12
The Ti adhesion layers were deposited onto the glass substrate for transparent capacitors using $Bi_2Mg_{2/3}Nb_{4/3}O_7$ (BMNO) dielectric thin films. Graphene was transferred onto the Ti/glass substrate after growing onto the Ni/$SiO_2$/Si using rapid-thermal pulse CVD (RTPCVD). The BMNO dielectric thin films were investigated for the microstructure, dielectric and leakage properties in the case of capacitors with and without Ti adhesion layers. Leakage current and dielectric properties were strongly dependent on the Ti adhesion layers grown for graphene bottom electrode.