http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
발전설비 보일러 튜브 용접부의 잔여수명평가 신뢰성 향상을 위한 기계적 물성 변화 연구
오병진,장중순,Oh, Byungjin,Jang, Joong Soon 대한용접접합학회 2013 대한용접·접합학회지 Vol.31 No.5
Boiler equipment in power plant is always being operated in harsh conditions and severely exposed to the extreme environment of high temperature. Therefore periodically the state of devices should be checked, diagnosed, and analyzed to ensure the reliability of the equipment. Traditionally, such a diagnosis is based one or two physical properties of the sample taken from the equipment like hardness, microstructure, etc.. However, to enhance the confidence of the diagnosis, it is necessary to synthesize those properties together. This paper is to propose such a synthetic procedure for T23 which was developed to be used in $569^{\circ}C/596^{\circ}C$ condition. Creep test and accelerated degradation test were performed simultaneously, and the physical properties such as microstructure, tensile strength, yield strength, hardness, and indentation properties were measured. This paper proposes a method of determining the remaining life by quantitative comparison. It will provide the basis of evaluating life assessment more objective and reliable.
급속 열처리 공정을 이용한 결정질 실리콘 태양전지의 전극 소결 최적화
오병진,여인환,임동건,Oh, Byoung-Jin,Yeo, In-Hwan,Lim, Dong-Gun 한국전기전자재료학회 2012 전기전자재료학회논문지 Vol.25 No.3
Limiting thermal exposure time using rapid thermal processing(RTP) has emerged as promising simplified process for manufacturing of solar cell in a continuous way. This paper reports the simplification of co-firing using RTP. Actual temperature profile for co-firing after screen printing is a key issue for high-quality metal-semiconductor contact. The plateau time during the firing process were varied at $450^{\circ}C$ for 10~16 sec. Glass frit in Ag paste etch anti-reflection layer with plateau time. Glass frit in Ag paste is important for the Ag/Si contact formation and performances of crystalline Si solar cell. We achieved 17.14% efficiency with optimum conditions.
오병진,엄남경,우성희,이상호,Oh, Byung-Jin,Eom, Nam-Kyoung,Woo, Sung-Hee,Lee, Sang-Ho 한국컴퓨터산업학회 2005 컴퓨터産業敎育學會論文誌 Vol.6 No.5
In the near future, we can access the information whenever we want, wherever we use because almost devices in ubiquitous environment are connected by either wired or wirelss networks. Especially, u-Learning which emphasizes on pedagogical property is enable to improve learning abilities. As researches of the previous u-Learning, there have been learning by mobile devices such as PDAs as well as the smart classroom which makes the remote students participate in the existing class. However, these researches have not satisfied pedagogical, cooperative and ubiquitous properties yet. Thus we suggest the framework for both local and mobile classroom, which can make the properties easy to satisfy. 향후 도래하는 유비쿼터스 환경에서는 모든 전자기기가 유/무선 통신망으로 연결되어 사용자는 언제 어디서나 원하는 정보에 접근할 수 있다. 특히, u-러닝(Ubiquitous-Learning)은 교육학적인 측면 뿐 아니라 어디서나 접근할 수 있다는 유비쿼터스적인 측면을 통해 학습의 효과를 보다 향상시킬 수 있다. 현재까지 추진된 u-러닝의 연구사례로, 주어진 학습 컨텐츠를 PDA를 이용하여 야외에서 학습할 수 있도록 하며, 원격지 모바일 환경의 학생들을 교실 수업에 참여시키는 스마트교실 등이 있다. 그러나 기존의 연구들에서는 학습자의 상호작용이나 협동학습 등의 교육학적인 속성과 유비쿼터스의 환경적 속성을 만족시키지 못함에 따라 본 연구에서는 어디서나 교실 환경에 참여하는 유비쿼터스 환경에 적합하면서도 교육학적인 면을 만족시키는 모바일 교실 프레임워크를 제안하고자 한다.
결정질 실리콘 태양전지의 Ag 촉매층을 이용한 나노 텍스쳐링 공정에 관한 연구
오병진,여인환,김민영,임동건,Oh, Byoung-Jin,Yeo, In-Hwan,Kim, Min-Young,Lim, Dong-Gun 한국전기전자재료학회 2012 전기전자재료학회논문지 Vol.25 No.1
In our report a relatively simple process for fast nano-texturing of p-type(100) CZ- silicon surface using silver catalyzed wet chemical etching in aqueous hydrofluoric acid (HF) and hydrogen peroxide solution($H_2O_2$) at room temperature. The wafers were saw-damaged by NaOH(6 wt%) at $60^{\circ}C$ for 150s. To obtain a nano-structured black surface, a thin layer of silver with thickness of 1 - 10 nm was deposited on the surfaces by evaporation system. After this process the samples were etched in HF : $H_2O_2$ : $H_2O$ = 1:5:10 at room temperature for 80s - 220s. Due to the local catalytic of the Ag clusters, this treatment results in the nano-scale texturing on the surface. This resulted in average reflectance values less than 9% after the silver on the surface of the wafers were removed.