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        Planarization of Wafer Edge Profile in Chemical Mechanical Polishing

        박영봉,정해도,정호빈,최성하 한국정밀공학회 2013 International Journal of Precision Engineering and Vol.14 No.1

        Within wafer non-uniformity (WIWNU), which significantly affects the yield of chip products, is mainly caused by non-uniform chemical mechanical polishing (CMP) at the wafer’s edge. This study investigates the origins of the non-uniformity and presents a process that uses an edge profile control ring (EPC ring) to solve the problem. The EPC ring is designed to be positioned between the wafer and the retaining ring and pressed at the same pressure as the wafer by a flexible membrane to reduce the pressure discontinuity between the center region and the edge region of the wafer. Experimental results show that for a WIWNU of 2%, the EPC ring makes it possible to shrink the edge exclusion region from 15 mm to 2 mm without any change in process conditions. This result suggests that the EPC ring is applicable to real fabrication.

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        Effect of Contact Angle between Retaining Ring and Polishing Pad on Material Removal Uniformity in CMP Process

        박영봉,정해도,이현섭,이영균,박선준 한국정밀공학회 2013 International Journal of Precision Engineering and Vol. No.

        This paper presents the effect of the contact angle between the retaining ring and the polishing pad in chemical mechanical polishing (CMP) on the profile of the material removal rate (MRR) around the wafer edge and on the within-wafer nonuniformity (WIWNU). This study demonstrates that the mechanical interaction among the polishing pad, wafer, and retaining ring influences the ability to achieve planarization from the CMP process. In particular, the purpose of this study is to understand the effect of the contact conditions between the retaining ring and the pad on the CMP process. In order to verify the mechanical aspects of the MRR near the wafer edge, retaining rings with different contact angles were prepared. Finite element analysis (FEA) verified the effect of the contact angle between the retaining ring and the polishing pad on the stress distribution around the edge of the wafer. The results of the analysis were corroborated by conducting CMP experiments with 200-mm blanket oxide wafers. As expected, the FEA results were in good agreement with the MRR profile around the edge area. Through simulations and experiments, we concluded that the contact angle is an important factor to achieve a flatter edge profile and the material removal profile around the edge of the wafer was optimum at a 0o contact angle. In particular the WIWNU was below 4% when a flat retaining ring was used. The results of this study make it possible to improve the yield of chip production by ensuring the retaining ring maintains perfect flatness without making any special design changes to the CMP equipment.

      • 狀況適合性에 있어서의 리이더쉽과 動機의 相關性 硏究

        朴永奉 嶺南大學校社會科學硏究所 1989 社會科學硏究 Vol.9 No.1

        The purpose of this study is to clarify the relationship on leadership and motivation in the Contingency Theory. This theory deals more on the relationship between organization and situation. The basic idea of the Contingency Theory is that situational elements of environment or technique and the suitability of the characteristics of organization influence organizational effectiveness. Since an organization aims to successfully achieve its goal, an organization must apply itself to the situation. However, such analysis of the theory of situational effectiveness has been of little concern in the past. Before the appearance of the Contingency Theory, more emphasis was placed on the search for the reason of rationality in an organization or the satisfaction, motivation of employee structure rather than application of the situation. The Contingency Theory has more meaning, glimpsing on correcting the old trends of misleading ideas. Such as this, the Contingency Theory tries to upgrade the effectiveness of organization and place more emphasis on the SL Theory. Leaders should have an excellent knowledge of judgment to solve various problems in an organization ; but even a manager with excellent judgment cannot always be an effective leader unless he adjusts himself to the situation. The method of study on the quality of normal leadership has been developed. That is how a leader can apply himself to the situation-this is called an SL Theory. However, the SL Theory even emphasizes that a leadership style also should consider the parlous motivation theory of needs. The natural motivation is not a fixed one, but is very flexible ; and in actual management, it is hoped that the matured motivation would lead one from fundamental needs, such as hygenic and safety needs, to a higher degree of motivation, such as social adjustment and self-esteem. The Contingency Theory should be applied to the leadership theory, as well as, to the motivation theory. It is true that the degree of accomplishment of motivation should be changed by the situation. There are many elements in the environmental situation for motivation. The leadership style is one of the elements of a situation. Therefore, according to the leadership style, the degree of accomplishment of motivation should be different. That is to say, if one should like to raise the motivation maturity, the leadership style must be raised. Development cycle must be raised. Development cycle theory also asserts that when the degree of leadership style be gradually raised then subordinate ones should be raised accordingly. Then a questions occurs-if the leadership style has been upgraded, should not their motivation be upgraded? The summary of this report tries to clarify the problem theoretically by fact findings. From this reason, it can be safely said that such a title is appropriate. If the theory that the leadership should be applied to the environmental situation, called SL Theory, the theory that the accomplishment of motivation should be changed to the environmental and can be called SM Theory. Of course, there are many elements of motivations and environmental situation differences. Especially, it is very important to find out if the initial lower steps of their needs are satisfied. One's own educational background and expectations are an important factor. Therefore, leadership is also one of the important elements as stated above. However, in actual application, to the personnel manager, it is relatively an easy one. It is clear that when lower needs of motivation are fulfilled, this may bring higher needs of motivation. One's intellect and expectations can be raised some degree by higher education. It is relatively difficult to change leadership style, but it does seem easier if it is compared to the parlous theory of changing a person's character and his hope. Therefore, in actual management, one needs to carefully apply good judgment in regard to using the achievement-motivation-needs theory. By applying a suitable leadership style, he can achieve his goal of management. An aggressive personnel management plan is needed which can lead to higher motivation-gradually, by partially upgrading leadership style for proper upward motivation. This kind of aggressive personnel management is surely important in order to accomplish a goal to develop more top-level personnel managers. By the SL Theory, if leadership style can be adjusted to a given situation of motivation, an organization is stabilized, and its effectiveness can be assured. However, to develop personnel needs and to bring about the accomplishment and development of an organization, it is necessary to raise the motivation by the SM Theory.

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