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Electrodeposition of an alumina precursor on a silicon carbide surface
Yoshihiro Hirata,Masaru Murao,Tomoyuki Maeda,Naoki Matsunaga,Soichiro Sameshima 한양대학교 세라믹연구소 2007 Journal of Ceramic Processing Research Vol.8 No.5
An electrodeposition method was used to form nanometre-sized alumina particles on a silicon carbide surface. A direct current in the range from 0.15 to 11.8 mA/m2 was flowed between a cylindrical carbon cathode and a porous silicon carbide anode in an aqueous solution containing ethylenediaminetetraacetatoaluminium (III) (Al-EDTA¯) at a pH 6. The current density increased with an increase of the applied voltage and showed a maximum as a function of deposition time. The deposited alumina precursor was estimated to be (OH)Al(OOCH)2. After calcination at 800ºC in an Ar atmosphere, the uniformly deposited precursor changed to alumina particles with a specific surface area of 44.3 m2/g. An electrodeposition method was used to form nanometre-sized alumina particles on a silicon carbide surface. A direct current in the range from 0.15 to 11.8 mA/m2 was flowed between a cylindrical carbon cathode and a porous silicon carbide anode in an aqueous solution containing ethylenediaminetetraacetatoaluminium (III) (Al-EDTA¯) at a pH 6. The current density increased with an increase of the applied voltage and showed a maximum as a function of deposition time. The deposited alumina precursor was estimated to be (OH)Al(OOCH)2. After calcination at 800ºC in an Ar atmosphere, the uniformly deposited precursor changed to alumina particles with a specific surface area of 44.3 m2/g.