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조순행 ( Soon Haing Cho ),이병진 ( Byung Jin Lee ) 한국폐기물자원순환학회(구 한국폐기물학회) 2002 한국폐기물자원순환학회지 Vol.19 No.1
The objectives of this study were to examine the applicability of ammonia stripping process for the removal of highly concentrated ammonia nitrogen in the wafer cleaning wastewater from semiconductor producing procedure and to recover removed ammonia nitrogen in the consideration of natural resource recycle. Also, the capital cost and operating cost was reviewed to suggest the optimal operation condition of ammonia stripping according to changes in the operation conditions. Using Ca(OH)2 for pH control of wastewater was superior economically to use off NaOH and ammonia stripping was possible without removal of sludge. The optimal pH of ammonia stripping was 10.5. The ammonia nitrogen was removed rapidly along with increasing reaction temperature and air flow rate. The reaction time to satisfy 800 mg NH3-N/L was 4, 2.3, 1.4, 0.9hrs at 25, 35, 45 and 55℃, respectively, with the air flow rate of 20L/min. In addition, H2O2 was removed completely, about 95% of organic nitrogen was removed, and up to 81.2% of ammonia nitrogen was recovered by ammonia stripping process. Capital cost and operating cost also were decreased along with the increased reaction temperature and air input. In conclusion, the ammonia stripping process was very efficient in the treatment of highly concentrated nitrogen in wafer cleaning wastewater and the optimal operating condition of ammonia stripping was at pH of 10.5 and temperature of 55℃ with air flow rate of 20L/min among applied operation conditions.