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- 저자 : 이현숙 ( Huyn Sook Lee ) (검색결과 1 건)
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폴리쉬 리무버 반복시술에 따른 손톱의 물리적 성상과 형태학적 변화
이나리 ( Na Ri Lee ),송원길 ( Won Kil Song ),최은미 ( Un Mi Choi ),이현숙 ( Huyn Sook Lee ),김기영 ( Ki Young Kim ) 한국미용학회 2010 한국미용학회지 Vol.16 No.4
Nail products such as polish, polish remover and acrylates are widely used. And nail products have problems and risks of not only nail damage but also neurological abnormality, irritation of skin and mucous, reproductive disorder. So that, the aim of this study is to observe change of physical property and morphology on nail by treatment with nail removers. 5 women`s nails were collected and divided into 3 groups (non-treated, acetone remover treated, acetone free remover treated) and treated with two polish removers in one time, 3-times and 5-times. The thickness of transverse and roughness of surface were measured and observed after polish and polish remover treatment by hair diagnostic apparatus, SEM and AFM. The findings showed that the nails in the acetone-content polish remover group were significantly thin from 5.2±0.1 μm to 4.7±0.3 μm after 3-times of treatment and to 4.3±0.2 μm after 5-times of treatment (p<0.05), while those treated with acetone-free removers became also significantly thin from 5.1±0.1 μm to 4.9±0.1 μm after 3-times and to 4.6±0.1 μm after 5-times of treatment (p<0.05) in compared to non treated group. Observation with SEM from the morphological viewpoint, transverse and surface of the nails in the non-treated group featured relatively solid and high adhesion in the intermediate layer of keratine. After 3- and 5-times of treatment in repeatedly treated group. The aceton plish remover group with some scratches were found to be lysated and clotted and cuticles came off heavily from the transverse. In case of acetone-free remover group, however, a slight crack, clotting and crumbs appeared between layers after 3- and 5-time treatment and peeling off process of cuticles were slower compared to the case of acetone-content polish remover group by observation of SEM. The nails in acetone-content polish remover group was significantly increased in the roughness from 0.56±0.06 μm to 0.66±0.03 μm after 3-times treatment and to 0.78±0.02 μm after 5-times treatment (p<0.05), while the surface treated with acetone-free remover treated group was observed to have slightly increase of roughness from 0.56±0.06 μm to 0.58±0.11 μm after 3 times of treatment and to 0.61±0.02 μm after 5 times by AFM (p<0.05). These data suggested that acetone-free remover may be damaged to nails weaker than acetone-content remover.
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