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Dichlorosilane Gas를 이용한 High Temperature Oxide Thin Film의 특성
이승석(S.S. Lee),이석희(S.H. Lee),김종철(J.C. Kim),박헌섭(H.S. Park),오계환(K.H. Oh) 한국진공학회(ASCT) 1992 Applied Science and Convergence Technology Vol.1 No.1
Dichlorosilane(DCS) gas를 이용한 High Temperature Oxide(HTO) thin film의 물리적, 전기적 성질에 대해서 고찰하였다. 낮은 wet etch rate와 우수한 step coverage 특성을 보였으며, Si-O bond 양상은 Thermal Oxide와 유사하였다. I-V 특성 역시 thermal oxide에 근접하였으나, Time Dependent Dielectric Breakdown(TDDB) 결과는 thermal oxide의 ¼ 수준이었다. 반면, 넓은 면적 (0.3㎠)에서 측정된 defect density level은 thermal oxide보다 훨씬 우수하였다. In this study we have investigated physical and electrical properties of high temperature oxide (HTO) thin film using dichlorosilane (DCS) gas. This film had low etch rate and excellent step coverage, and its characteristics of Si-O bond were similar to those of thermal oxide. I-V curves also showed similar electrical properties to those of thermally grown oxide (SiO₂) while time dependent dielectric breakdown (TDDB) results revealed ¼ value of thermal oxide. However, defect density was measured to be much lower value than that of thermal oxide.
김준수(J . S . Kim),변재원(J . W . Byeon),권숙인(S . I . Kwun),이승석(Seung Seok Lee),안봉영(Bong Young Ahn) 한국열처리공학회 2001 熱處理工學會誌 Vol.14 No.1
N/A The microstructural changes with pearlite formation heat treatment in eutectoid steel(railway steel) consisting of only pearlite structure were evaluated by the ultrasonic attenuation and velocity measurements. The result of this investigation showed a strong linear dependence of ultrasonic attenuation on pearlite interlamellar spacing, and accordingly on fracture strength of the pearlite.