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초기 산화피막 제거와 양극산화 시간에 따른 다공성 알루미나 막의 성장
김대환(Dae Hwan Kim),류상희(Sang Hee Lue),이효진(Hyojin Lee),박영옥(Youngok Park),이은중(Eun Joong Lee),고태준(Taejoon Kouh) 한국자기학회 2010 韓國磁氣學會誌 Vol.20 No.5
We have investigated the effect of the removal of an initial oxide layer and the anodization time on the growth of the porous alumina layer. The porous alumina layer was fabricated by two-step anodization process with phosphoric acid. We have observed the changes in the uniformity of the pore structure by varying the removing time of the initial oxide layer after the first anodization with phosphoric acid and chromic acid, and noted that its uniformity improves with the removing time. We have also determined the thickness of the alumina layer after the final anodization process and found that the thickness increases linearly with the anodization time. Under 150 V of anodization voltage with phosphoric acid, the growth rate of the porous alumina layer is determined to be 22.5 ㎚/min.