Polymer thin films exhibit properties distinct from bulk materials due to confinement and interfacial effects. Under solvent exposure, polymer chains undergo rearrangement driven by changes in chain mobility and interfacial interactions. However, solv...
Polymer thin films exhibit properties distinct from bulk materials due to confinement and interfacial effects. Under solvent exposure, polymer chains undergo rearrangement driven by changes in chain mobility and interfacial interactions. However, solvent-induced behavior in nanometer-thick films remains difficult to understand because of the complexity of interfacial phenomena under confinement. This dissertation investigates the structural and interfacial behavior of polymer thin films under solvent interactions, focusing on polymer adsorption layers formed at solid substrates. Solvent vapor annealing was used to examine homopolymer adsorption layers with controlled thicknesses. The results show that solvent-induced structural responses strongly depend on adsorption-layer thickness, and that solvent exposure can induce chain rearrangement and modify interfacial structure in ultrathin layers. This study further extends the investigation from homopolymer adsorption layers to block copolymer nanopattern systems. The morphology transformation of block copolymer surface micelles under solvent immersion was analyzed, demonstrating that solvent–polymer–substrate interactions govern the reorganization of block copolymer nanostructures. Overall, this dissertation provides insight into solvent-induced interfacial rearrangement in polymer thin films and offers a framework for understanding and controlling interfacial structure and nanoscale organization using solvent-based processing.