Tetrafluoromethane (CF4), widely used in the semiconductor industry, is a highly stable and potent greenhouse gas. Plasma decomposition technology breaks down CF4 into reactive species such as CF3, CF2, CF, and F, which play a critical role in determi...
Tetrafluoromethane (CF4), widely used in the semiconductor industry, is a highly stable and potent greenhouse gas. Plasma decomposition technology breaks down CF4 into reactive species such as CF3, CF2, CF, and F, which play a critical role in determining the treatment efficiency of downstream wet scrubbers. This study aims to elucidate the chemical forms of fluorine in the scrubber process and to determine how much of it dissolves into the liquid phase and how much is released into the gas phase. To this end, the types and concentrations of radicals generated in the plasma chamber were characterized using a dedicated sampling port coupled with quadrupole mass spectrometry (QMS), and the fluorine captured in the scrubber drain was quantitatively analyzed by high performance liquid chromatography (HPLC), enabling evaluation of the overall fluorine mass balance and its conservation across the entire system, including both the upstream and downstream of the scrubber. The results are expected to demonstrate that not only the degree of CF₄ decomposition but also the distribution and concentration of radicals such as CF₃, CF₂, CF, and F strongly influence the downstream wet scrubbing process and the overall DRE.