This thesis presents the design of a low-dropout regulator (LDO) integrating Gallium Nitride (GaN) devices with conventional silicon (Si) MOSFETs to leverage the advantages of both technologies. A GaN transistor serves as the pass element due to its e...
This thesis presents the design of a low-dropout regulator (LDO) integrating Gallium Nitride (GaN) devices with conventional silicon (Si) MOSFETs to leverage the advantages of both technologies. A GaN transistor serves as the pass element due to its excellent switching characteristics and low on-resistance, while Si MOSFETs in the error amplifier provide design flexibility and cost-efficiency. GaN devices are increasingly used in power management integrated circuits (PMICs) for their fast switching, high breakdown voltage, and low conduction losses. However, limited CMOS compatibility and high cost remain challenges. In contrast, Si MOSFETs are CMOS-compatible and cost-effective but constrained by material properties.
The proposed hybrid LDO improves performance over conventional Si-only designs with minimal cost overhead. Operating from a 5 V input, it delivers a stable 1.2 V output, achieving a power supply rejection ratio (PSRR) of -69 dB at 10 kHz, with low quiescent current and fast transient response. The GaN device, EPC2040, is externally configured due to modeling constraints, while the rest of the circuit is implemented in a 65 nm CMOS process. Experimental results confirm the feasibility and efficiency of integrating GaN technology into CMOS-based LDO architectures.